三田 信

A silicon shadow mask for evaporation or sputtering of any shape of patterns was fabricated by Al-Delay Masking Process (DMP). Using DMP, a Si high aspect ratio structure having arbitrary number of multiple-depth can be fabricated. By applying two layers of DMP, Si shadow mask with a mechanical alignment structure was fabricated. A Si chip on which deposition should be performed was successfully inserted to the mechanical alignment structure by tweezer, ensuring the high alignment precision less than ±5μm of the shadow mask aperture to the chip. With three layers of DMP, a shadow mask for deposition of a doughnuts-like shape was fabricated. The successful deposition of the doughnuts-like shape showed the large freedom of deposition patterns.

A Scratch-Drive-Actuator array is fabricated in an inverted way. According to the applied square wave of ±90V from 100Hz to 100kHz, the inverted SDAs successfully conveyed an object placed on it to the designed direction. Since SDA is a microactuator with several ten μN of force and several ten nm of actuation step, the inverted SDA will be a key device of precise, powerful conveyance system over a large area.