Ogino, T., Homma, Y., Kobayashi, Y., Hibino, H., Prabhakaran, K., Sumitomo, K., Omi, H., Suzuki, S., Yamashita, T., Bottomley, D. J., Ling, F., Kaneko, A.
Surface Science 514(1-3) 1-9 2002年 査読有り
The final goal of nanostructure integration based on self-assembly is full-wafer design of whole atomic-level structures. Toward this goal, we must first be able to control atomic steps, reconstructed domains, surface strain, and atomic species. Atomic steps can be rearranged artificially in a large area using lithographic technique and we are now close to achieving complete control of step positions. Patterns of reconstructed domain regions can be ordered by self-organization. In nanostructure self-assembly, such as the coherently grown Ge quantum nanostructures on Si(0 0 1) and Si(1 1 3) surfaces, strain engineering is important for controlling position, shape, and distribution. Ordered Ge-island chains on Si(0 0 1) show that artificial strain distribution design is a powerful tool for nanostructure integration. Surface composition on SiGe mixed surfaces can be reversibly changed by hydrogen adsorption and desorption. These approaches to designing surface structures show that the bottom-up approach is a promising alternative in semiconductor integration technology. (C) 2002 Elsevier Science B.V. All rights reserved.