D. Goto, Takahiro Namazu, S. Inoue, T. Takeuchi, K. Murakami, E. Komatsu, Y. Kawashimo, T. Takano
TRANSDUCERS 2009 - 15th International Conference on Solid-State Sensors, Actuators and Microsystems 1321-1324 2009年 査読有り
This paper describes a quantitative measurement method for Young's modulus of nanometer-thick film materials by using a MEMS resonator array. The MEMS resonators fabricated by silicon micromachining techniques were designed to be driven at their resonant frequencies from 6.0 kHz to 35.5 kHz. From the difference in resonant frequencies between before and after deposition of these films onto the resonators, we successfully measured the Young's moduli of Al and plasma-polymerization films made from CH4 and CHF3 gases. The obtained Young's moduli of Al, CH4 and CHF3-derived polymer films were found to be 60.4, 35.7, and 30.0 GPa on average, respectively, and showed no film thickness dependency in the range from 50 to 150 nm. The obtained values for all the films by the resonance tests were comparable to those by tensile and nanoindentation tests. The proposed technique is effective for directly measuring Young's modulus of nanometer-thick film materials. ©2009 IEEE.