春山 雄一

Abstract The impact of NiOx layers on the performance of inverted perovskite solar cells (PSCs) has been investigated using multiple analysis methods (thermal gravimetric, differential thermal analysis, X-ray diffraction, X-ray photoelectron spectroscopy, and Soft X-ray photoelectron spectroscopy) of NiOx layers, which were made by spray pyrolysis deposition at different temperatures. The analyses of this study indicate that the efficiency of inverted PSC increases with the Scherrer crystallite size of NiOx. We also observed that the band state of the NiOx layer was changed by Na+ ions migrated from the glass substrate, which also had an impact on the efficiency. The results clearly showed that under high fabrication temperature, migration of matter from the substrate to the hole transport layer affects the electronic structure. Therefore, how these materials are engineered will be important to increase the efficiency of inverted PSCs.

The effect of atomic hydrogen exposure on hydrogenated amorphous carbon (a-C:H) films was investigated by X-ray photoelectron spectroscopy (XPS). From the dependence of the wide-scan XPS spectra of an a-C:H film on atomic hydrogen exposure, it was shown that the film was etched with an etching rate of 0.2 nm min-1. In addition, by analyzing the C 1s XPS spectra, the coordination of C atoms in the a-C:H film was investigated as a function of the atomic hydrogen exposure and photoelectron emission angle. This indicated that the coordination of C atoms at the surface of the a-C:H film was not influenced by atomic hydrogen exposure. Therefore, we propose that the depth profile of a-C:H films can be measured with no damage using atomic hydrogen etching.

Anisotropic pyrochemical micro-etching induced by synchrotron X-ray irradiation is developed as a microfabrication process for fluorinated ethylene propylene (FEP). X-ray irradiation is performed at room temperature, and the irradiation area is etched by heating in an oven. By measuring the irradiation area using Raman spectroscopy, the peak of the Raman spectrum is shown to decrease with an increasing irradiation dose. It is also observed that the etching can be performed at a heating temperature of around 200 °C while maintaining the chemical composition of the surface. The etching mechanism is speculated to be as follows: X-ray irradiation causes chain scission, which decreases the number-average degree of polymerization. The melting temperature of irradiated FEP decreases as the polymer chain length is decreased so that the irradiated area can be evaporated at low temperatures of post-heating. In this way, we demonstrate that anisotropic pyrochemical micro-etching of FEP proceeds only in the depth direction where x rays are absorbed. It is possible to avoid deterioration of the shape accuracy arising from thermal expansion during the transfer process of the mask pattern by separating pre-irradiation from post-heating. Through this method, it becomes possible to realize a high precision microstructure of FEP in a large area.

<p>Ni and NiFe decorated pencil graphite rods have good performance for the oxygen evolution reaction. Capacitance data describe the redox processes of nickel and show OER activation after Ni⁴⁺ formation.</p>

Chemical modification of insulating material surfaces is an important methodology to improve the performance of organic field-effect transistors (OFETs). However, few redox-active self-assembled monolayers (SAMs) have been constructed on gate insulator film surfaces, in contrast to the numerous SAMs formed on many types of conducting electrodes. In this study, we report a new approach to introduce a pi-conjugated organic fragment in close proximity to an insulating material surface via a transition metal center acting as a one-atom anchor. On the basis of the reported coordination chemistry of a catecholato complex of Pt(II) in solution, we demonstrate that ligand exchange can occur on an insulating material surface, affording SAMs on the SiO2 surface derived from a newly synthesized Pt(II) complex containing a benzothienobenzothiophene (BTBT) framework in the catecholato ligand. The resultant SAMs were characterized in detail by water contact angle measurements, X-ray photoelectron spectroscopy, atomic force microscopy, and cyclic voltammetry. The SAMs served as good scaffolds of 7c-conjugated pillars for forming thin films of a well-known organic semiconductor C8-BTBT (2,7- dioctyl[1]benzothieno[3,2-b][1]benzothiophene), accompanied by the engagements of the C8-BTBT molecules with the SAMs containing the common BTBT framework at the first layer on SiO2. OFETs containing the SAMs displayed improved performance in terms of hole mobility and onset voltage, presumably because of the unique interfacial structure between the organic semiconducting and inorganic insulating layers. These findings provide important insight into creating new elaborate interfaces through installing coordination chemistry in solution to solid surfaces, as well as OFET design by considering the compatibility between SAMs and organic semiconductors.

2,2', 7,7'-Tetrakis(N,N-di-p-methoxyphenylamino)-9,9'-spirobifluorene (spiro-OMeTAD) is utilized as a p-type semiconductor layer in perovskite solar cells and solid-state dye-sensitized solar cells. Spiro-OMeTAD has been known to have a spiro center, leading to a random orientation. Although the molecular orientation of organic semiconductor materials influences the conductivity, which is directly related to semiconductor device characteristics, the molecular orientation of spiro-OMeTAD has not been fully discussed. In this study, we prepared spiro-OMeTAD layers on various substrates and investigated their orientation by grazing-incidence wide-angle X-ray scattering (GIWAXS) and near-edge X-ray absorption fine structure (NEXAFS). Additionally, we demonstrated that the molecular orientation of spiro-OMeTAD could be controlled by changing their surface energies by changing the substrate materials. Consequently, we could improve the electrical conductivity by improving its molecular orientation. The results of this study provide a guideline for the preparation of organic semiconductor material layers using the wet-coating method.

The charging effect often complicates photoemission spectroscopy and x-ray absorption spectroscopy of an insulating material. Here, monolayer graphene was used as a conductive layer to prevent the charging effect of insulating substrates such as glass and LiNbO3. Charging-free spectra were obtained with various photon energies ranging from vacuum ultraviolet light to hard x-rays. This method could also be applied to photoemission spectroscopy of epoxy adhesives and to photoemission electron microscopy of an insulating film. Photoelectron transmissivities for the transferred graphene film were evaluated over a wide kinetic energy range from 29 to 7910eV. A minimum transmissivity of similar to 0.1 was found at a kinetic energy of similar to 60eV, which rose to 0.86 at 7910eV. In terms of the kinetic energy dependence of the transmissivity, this method is especially suitable for conventional and hard x-ray photoelectron spectroscopy.

Copyright © 2020 American Chemical Society. An inexpensive, simple, and high-activity catalyst preparation method has been introduced in this work. Pt and RuOx catalysts were fabricated by soaking inexpensive graphite electrodes (pencil-lead graphite rod: PGR) in catalyst precursor solutions and using a simple flame-annealing method, which results in lower amount of Pt and RuOx catalyst layers. From X-ray photoelectron spectroscopy and near-edge X-ray absorption fine structure analysis, it has been found that platinum and ruthenium were deposited as zero-valence metal (Pt) and oxide (RuOx), respectively. Catalytic activities of Pt/PGR and RuOx/PGR for hydrogen evolution reaction (HER) and oxygen evolution reaction (OER) were evaluated using neutral 1 M Na2SO4 aqueous electrolyte, respectively. Although HER and OER currents using PGR without catalysts were -16 mA cm-2 (at -1.5 V vs Ag/AgCl) and +20 mA cm-2 (at +2.0 V vs Ag/AgCl), they were improved to -110 and +80 mA cm-2 with catalysts (Pt and RuOx), respectively. Such an inexpensive and rapid catalyst electrode preparation method on PGR using flame-annealing is a very significant method in the initial catalyst activity evaluation requiring a large amount of trial and error.

Submonolayer h-BN was grown on Ni foil in ultra-high vacuum by the diffusion and precipitation method and the growth process was studied by X-ray photoelectron spectroscopy. Formation of h-BN started to be observed at 600 degrees C. All through the process, the surface was always slightly B-rich, which is consistent with the fact that B which is soluble in Ni at a high temperature can diffuse in Ni by the conventional bulk diffusion and insoluble N cannot. Moreover, both formation and decomposition of h-BN were found to occur at elevated temperatures possibly depending on provision of N atoms to the surface. On the Ni surface, decomposition of h-BN was observed at a relatively low temperature of 800 degrees C. (C) 2019 The Japan Society of Applied Physics

Copyright © 2019 American Chemical Society. Inexpensive and sensitive graphite electrodes were fabricated by applying flame annealing to pencil-graphite rods (PGRs) as electrodes for water electrolysis cells. The resin (polymer, binder) on the surface of PGR was removed by flame annealing to make it porous, and the graphite electrodes with high activity and low cost were obtained. By flame annealing the PGR, although the PGR electrode became active upon water electrolysis, the PGR electrode became instable for long-time operation. The effects of flame annealing on PGR for water electrolysis were analyzed by SEM, FT-IR spectroscopy, Raman spectroscopy, NEXAFS, and electrochemical impedance spectroscopy (EIS).

Aluminum acetylacetonate-based AlOx thin films were introduced as a low-cost, high-quality passivation layers for crystalline silicon solar cells. Films were formed by a spin coating method on p-type silicon substrates at 450 degrees C in ambient air, O-2, or water vapor (H2O/O-2) for 15 or 120 min. XPS analysis confirms the AlO2 formation and reveals a high intensity of interfacial SiOx at the AlO2/Si interface of processed wafers. Ambient H2O/O-2 was found to be more beneficial for the activation of introduced AlO2 passivation films which offers high lifetime improvements with a low thermal budget. Carrier lifetime measurements provides that symmetrically coated wafers reach 119.3 mu s and 248.3 mu s after annealing in ambient H2O/O-2 for 15 min and 120 min, respectively.

© 2018 IOP Publishing Ltd. The electronic structure of monolayer hexagonal boron nitride grown on Ni by the diffusion and precipitation method was studied by x-ray absorption spectroscopy, emission spectroscopy, x-ray photoelectron spectroscopy and micro-ultraviolet photoemission spectroscopy. No indication of hybridization between h-BN π and Ni 3d orbitals was observed. That is, the monolayer h-BN was found to be in the quasi-free-standing state. These results are in striking contrast to those of previous studies in which h-BN was strongly bound to the Ni surface by the orbital hybridization. The absence of hybridization is attributed to absence of a Ni(111) surface in this study. The lattice-matched Ni(111) surface is considered to be essential to orbital hybridization between h-BN and Ni.

Nanoimprinting can be used to fabricate various nanostructures on materials without etching processes. We previously demonstrated that the molecular orientation of a photocrosslinkable liquid crystalline polymer (PLCP) was induced by nanoimprinting, using a process called nanoimprint graphoepitaxy. In the current study, we performed multiple nanoimprint graphoepitaxy steps on PLCP films and investigated the resulting molecular orientations. Double nanoimprint graphoepitaxy on the PLCP produced a simple 2-µm line-and-space pattern with a dot molecular orientation pattern.

The nanoimprint process is a useful technique for the fabrication of various nanostructures on functional materials without the use of any etching processes. We previously confirmed that the molecular orientation of a photo-crosslinkable liquid crystalline polymer (PLCP) was induced by nanoimprinting using a process called nanoimprint graphoepitaxy. In this work, we repeat the previous O<inf>2</inf>reactive ion etching processing and molecular orientation evaluation to examine the depth profile of the unidirectional molecular orientation that is induced by nanoimprint graphoepitaxy. The results obtained indicate that the initial PLCP film thickness affects the resulting unidirectional molecular orientation depth.

Polarized UV absorption and near-edge X-ray absorption fine structure (NEXAFS) spectroscopies are used to investigate the influence of film thickness on the thermally stimulated photoinduced reorientation of a polymethacrylate film comprised of 4-methoxycinnnamoylbiphenyl (MCB) side groups connected with a decylene spacer (PMCB10M) in the bulk (&gt; 10 nm), at the inner-surface (similar to 10 nm), and at the near-surface (&lt; 2 nm). Irradiation with linearly polarized (LP) UV light and subsequent annealing generate a biaxial molecular reorientation in the bulk of thick PMCB10M films, while the out-of-plane orientation is restricted in films less than 55-nm thick. In contrast, the in-plane reorientation is dominant at the near-surface regardless of the film thickness. Consequently, the roles of the rigid mesogenic MCB moieties and the flexible long decylene spacer depend on the film thickness. (C) 2016 Elsevier Ltd. All rights reserved.

Enantioselective hydrogenation of α-phenylcinnamic acid (PCA) and p,p′-dimethoxyphenylcinnamic acid (DMPCA) was studied over a variety of commercial 5 % Pd/C catalysts to reveal catalyst properties suitable for obtaining high enantioselectivity. The catalysts were characterized by CO adsorption, X-ray photoelectron spectroscopy (XPS), and transmission electron microscopy (TEM). It is confirmed that pretreatment at 353 K under atmospheric pressure of H2 before modification with cinchonidine is very effective for all the Pd/C catalysts used here to improve the selectivity and reaction rate. It is suggested that the distribution of Pd metal particles is crucial to attain high selectivity (ee% = 79 ± 1 for PCA, 89 ± 2 for DMPCA): a uniform or eggshell-type distribution of Pd is more suitable than an egg-white or egg-yolk-type distribution. It is also suggested that the dispersion of Pd metal particles controls the enantioselectivity over cinchonidine (CD)-modified Pd/C catalysts. XPS techniques are proposed to provide a convenient method to find desirable catalysts. The choice of such Pd/C catalysts could facilitate high-throughput guided study on highly enantioselective hydrogenation of α,β-unsaturated carboxylic acids.

© 2016 the Owner Societies. The CH3NH3PbI3 perovskite solar cells have been fabricated using three-porous-layered electrodes as, 〈glass/F-doped tin oxide (FTO)/dense TiO2/porous TiO2-perovskite/porous ZrO2-perovskite/porous carbon-perovskite〉 for light stability tests. Without encapsulation in air, the CH3NH3PbI3 perovskite solar cells maintained 80% of photoenergy conversion efficiency from the initial value up to 100 h under light irradiation (AM 1.5, 100 mW cm-2). Considering the color variation of the CH3NH3PbI3 perovskite layer, the significant improvement of light stability is due to the moisture-blocking effect of the porous carbon back electrodes. The strong interaction between carbon and CH3NH3PbI3 perovskite was proposed by the measurements of X-ray photoelectron spectroscopy and X-ray diffraction of the porous carbon-perovskite layers.

The electronic structures of four kinds of fluorinated self-assembled monolayers (F-SAMs) with different chain length, which were used for an antisticking layer, were investigated by the photoemission and the near-edge X-ray absorption fine structure (NEXAFS) spectroscopies. From the photoemission spectra in the wide and in the C 1s core-level regions, chemical compositions and components of the F-SAMs with different chain length were evaluated. By using the curve fitting analysis of the photoemission spectra in C 1s core-level region, it was found that the CF3 site is located at the top of the surface in the C sites of the F-SAM. From the C K-edge NEXAFS spectra of the F-SAMs as a function of the incidence angle of the excitation photon, it was shown that the sigma*(C-F) and sigma*(C-C) orbitals in the F-SAMs are parallel and perpendicular to the surface, respectively. This indicates that the C-C chain in (CF2) (n) part of the F-SAMs is perpendicular to the surface. Based on these results, the electronic structures of the F-SAMs are discussed.

The electronic structure of fluorinated self-assembled monolayers (F-SAMs) with different chain lengths was investigated by photoelectron and near edge X-ray absorption fine structure (NEXAFS) spectroscopy. From the measurements of the photoelectron spectra in the wide region and in the C 1s core-level region, the chemical compositions and components of the F-SAMs with different chain length were clarified. In the C K-edge NEXAFS spectra of the F-SAMs, the several spectral features were observed and the intensity of the features at 292 eV and 299 eV decreased with increasing incidence angle of the excitation photons. Based on the results of the photoelectron and NEXAFS spectral measurements, the electronic structure of four F-SAMs with different chain length is discussed. (C) 2015 Wiley Periodicals, Inc.

The electronic structure of the fluorinated self-assembled monolayer (F-SAM) was investigated by using the photoelectron spectroscopy in the valence band region. The photon energy dependence of the photoelectron spectra in the valence band region of the F-SAM was measured from 50 to 420 eV and the orbital components of the photoelectron spectra were clarified. By measuring the photoelectron spectra in the valence band region of four types of F-SAM with different chain lengths, we obtained the evolution of the electronic structures in the F- SAM. In addition, the energy level of the F-SAM molecule obtained by ab initio molecular orbital calculation in a previous study was compared with the photoelectron spectrum in the valence band region. On the basis of the results of the photoelectron spectroscopy measurements in the valence band region, the electronic structure of the F-SAMs is discussed. (C) 2015 The Japan Society of Applied Physics

Room temperature (RT) nanoimprinting is an attractive technique for nanofabrication, because it is not required a thermal cycle or UV irradiation process. Previously, it has reported that RT-nanoimprinting enables the fabrication of nanostructures using hydrogen silsesquioxane (HSQ) as a resin. HSQ has the HSiO3/2 structure and transforms to SiOx, such as glass, upon annealing. We developed, for the first time, reversal nanoimprint using RT nanoimprint to fabricate a three-dimensional (3D) HSQ structure and succeeded in fabricating a 3D HSQ nanostructure with two cros-sstacked layers. Furthermore, it was confirmed that the 3D HSQ structure has a sufficient interface adhesion between the upper and lower layers by a durability test using ultrasonic vibration and also that it was not deformed after an annealing treatment at 1000 degrees C. (C) 2015 The Japan Society of Applied Physics

The thermally stimulated photoinduced in-plane and out-of-plane molecular reorientation behaviors of a polymethacrylate film comprised of 4-methoxycinnnamoylbiphenyl (MCB) side groups connected with a decylene spacer (PMCB10M) are compared in the bulk (&gt;10 nm), at the inner-surface (similar to 10 nm), and at the near-surface (&lt;2 nm) using polarized UV absorption and near-edge X-ray absorption fine structure (NEXAFS) spectroscopies. The biaxial reorientation characteristics in the bulk of the PMCB10 M films can be controlled by irradiating with linearly polarized (LP) UV light and subsequent annealing to generate self-organization of the MCB side groups. However, the homogeneous in-plane orientation at the near-surface, which can introduce homogeneous nematic low-molecular-weight liquid crystal mixture alignment, is observed regardless of the self-organization process. The differences in the orientation characteristics arise from long alkylene spacer and bulky mesogenic side groups.

This is the first report of surface-enhanced Raman scattering (SERS) substrate fabrication using a combination of imprinted hydrogen silsesquioxane (HSQ: HSiO3/2) patterns and self-assembly of gold nanoparticles (AuNPs). To assemble the AuNPs inside the imprinted HSQ pattern, it is important to understand the interactions between AuNPs and AuNPs, and those between AuNPs and HSQ. The authors investigated the effects HSQ surface charges on the self-assembly of AuNPs. It was found that the negatively charged AuNPs were successfully assembled according to the geometry of the negatively charged HSQ pattern. In addition, it was shown that the SERS substrate fabricated from an HSQ consisting of an inorganic polymer was suitable for organic chemical analysis, by comparing it with a substrate fabricated using an organic polymer.

Nanoimprint lithography has two basic steps. The first is the imprint step in which a mold with nanostructures on its surface is pressed into a resin film on a substrate, followed by removal of the mold. The second step is the residual layer removal by a reactive ion etching (RIE). There is no report whether the properties of the imprinted structure after RIE change or not. In this work, the authors evaluated the Young's modulus of the imprinted pillar after residual layer removal by RIE. In this experiment, hydrogen silsesquioxane (HSQ), a type of spin-on-glass, was used as an imprint material. The residual layer was etched by RIE using CHF3 gas. The Young's modulus of imprinted pillar after RIE was measured via cantilever method. The Young's modulus of HSQ pillar after RIE was twice as much as that of HSQ pillar before RIE. From the Fourier transform infrared measurement, it was founds the chemical structure of HSQ was changed by forming network structure due to heating by RIE plasma energy. These results indicate that the mechanical property of imprinted structure was changed in the residual layer removal step by using RIE.

Polarization-dependent near-edge X-ray absorption fine structure (NEXAFS) measurement is performed to investigate orientation structures of the near-surface of the reoriented photo-cross-linkable liquid crystalline polymer (PMCB6M) films, which are applicable to liquid crystal (LC) alignment layer. The 3D orientation parameter at the near-surface of the reoriented PMCB6M film is similar to 0.7, which is similar to the results obtained by a polarization absorption spectroscopy that evaluates the reorientation behavior in bulk. Furthermore, more preferable in-plane orientation is observed at the nearest surface of the film, and the phenyl rings in the reoriented mesogenic side groups show slightly perpendicular orientation to the surface normal.

Molecular orientation in photoreactive liquid crystals (LCs) can be induced by linearly polarized ultraviolet and heat. Thermal nanoimprinting has similarities to graphoepitaxy, including using patterned substrates and heating. Diffraction efficiencies were measured to compare the molecular orientation of the photoreactive LC polymer P6CAM induced by thermal nanoimprinting, with that induced by graphoepitaxy. P6CAM was reoriented by graphoepitaxy, but the degree of orientation was much smaller than that induced by thermal nanoimprinting. (C) 2014 Elsevier B.V. All rights reserved.

The mold- and antisticking-layer-lifetime improvement is required in nanoimprint lithography. One of the effective methods for such improvement is the use of a resin with release properties. To induce the release properties, fluorosurfactants are added to a nanoimprint resin. The compatibility of fluorosurfactants with resins is an important factor because it affects the segregation of fluorosurfactants. We added two types of fluorosurfactants to an ultrathin UV nanoimprint resin of about 20 nm thickness; one is compatible, and the other is non compatible with the resin. Then, we evaluated the fluorosurfactant depth distribution in an ultrathin resin film by X-ray photoelectron spectroscopy. Contrary to our expectation, both types of fluorosurfactants were segregated on the resin surface. Furthermore, it was confirmed by atomic force microscopy that the non compatible fluorosurfactant agglutinates on the resin surface containing a high additive amount was contained in the resin. (C) 2014 The Japan Society of Applied Physics

Because of the potential for use in display applications, photoalignment using photosensitive materials has received considerable attention. Herein, the influence of film thickness on thermally stimulated photoinduced molecular reorientation structures of photoreactive liquid crystalline polymer films at the near-surface and in bulk is investigated using near-edge X-ray absorption fine structure (NEXAFS) and polarization UV absorption spectroscopies, respectively. In films less than 90-nm thick, the uniaxial in-plane orientation order in bulk gradually decreases. In contrast, films thicker than 40 nm show a sufficient molecular orientation at the near-surface. The three-dimensional orientation structures are investigated using obliquely reoriented films fabricated by slantwise p-polarized UV light exposure. Films thicker than 40 nm display an effective slantwise orientation in bulk, but the slantwise angle at the near-surface is much smaller than that in bulk. Both the substrate film interface and film thickness play important roles in the reorientation behavior not only in bulk but also at the near-surface of the photoalignment film.

Simultaneous achievement of high sensitivity and low line edge roughness (LWR) is necessary in EUV resist. The chemical reaction analysis of EUV (Extreme Ultraviolet) chemical amplified (CA) resist and acid diffusion length evaluation was carried out. In order to achieve low LWR of the CA resist, the large chemical structure of the anion of photoacid generator (PAG) is required for shortening the acid diffusion length. On the other hand, in order to increase the sensitivity, on the basis of the chemical reaction analysis using the soft x-ray absorption spectroscopy, the decomposition reaction of the large chemical structure of the PAG anion should be taken in account in addition of ionization reaction. However, if the decomposition reaction occur, the acid diffusion length will become shorter than that as expected. It is found that the Imidate-type of anion of PAG has high sensitivity and short diffusion length. The chemical reaction analysis by the soft x-ray absorption spectroscopy using the synchrotron radiation with the combination analysis of the acid diffusion are useful method for the mitigation of high sensitivity and low LWR.

Nanoimprint lithography (NIL) is a simple fabrication process used to produce nanostructured devices with high resolution, high throughput and at low cost. The resolution of the mold pattern determines the resolution of the imprint pattern obtained. Thus, to improve the resolution of the nanostructures attainable by NIL, new methods are required to produce higher-resolution molds. In photolithography, double patterning significantly enhances the resolution of the nanoscale features. We demonstrate the use of double patterning nanoimprinting using ultraviolet and room-temperature-NIL resin systems. This paves the way toward a much greater variety of higher-resolution NIL products. (C) 2013 Elsevier B.V. All rights reserved.

Ultraviolet (UV) nanoimprinting includes a contact process necessary for transferring nanoscale features from a mold to a UV-curable resist coated on a substrate. The demolding that comes with the contact process is a source of defects, and an obstacle to be overcome for nanodevice fabrications. In this study, we aim to execute more than 10000 times of step-and-repeat UV nanoimprinting with a single mold, tracing demolding forces and water contact angles of the mold surface as the indication of mold-resist/substrate interface and mold degradation. A condensable gas, a UV-curable resist, and a fluorosurfactant were considered in this study. It was revealed that 1,1,1,3,3-pentafluoropropane (PFP) or HFC-245fa, which is the common industrial name, as a condensable gas and a type of fluorosurfactant played an important role in minimizing the demolding impact and thus helped in increasing mold lifetime. The surfactant-added resists performed 6500 imprinting steps in PFP.

A material analysis beamline which is designed to useable in the wide energy range, 50 similar to 4000 eV for the various industrial demands, was constructed at BL05 in NewSUBARU for industrial companies' use in cooperation with the Laboratory of Advanced Science and Technology for Industry (LASTI), University of Hyogo and well-informed researchers in the industrial world. BL05 consists of two branch lines, which is mounted with a double crystal monochromator at BL05A and grating monochromator at BL05B. XAFS measurements in the total electron yield mode and partial fluorescence yield mode using a silicon drift detector can be performed at the both branch lines. In addition, the photoelectron spectra can be measured at BL05B. The maintenance and management of BL05 are performed by Synchrotron Analysis LLC (SALLC), which is a consortium of user companies of BL05, under the supervision of the LASTI staff. If industrial users want help with measurements at BL05, operators of SALLC can assist them.

The authors report density measurements of a pillar structure that was fabricated via nanoimprinting using a poly(dimethylsiloxane) mold. The imprinted pillars were fabricated using two types of resin, SU-8 and hydrogen silsesquioxane, and were characterized by measuring the spring constant using a scanning probe microscopy cantilever, which was manipulated with a three-axis actuator. The spring constant determined Youngs modulus of the imprinted pillars. The authors measured the resonant frequency using the alternating current electrostatic force. Using the results for Youngs modulus and the resonant frequency, they determined the density of the pillar structure fabricated via nanoimprinting. © 2012 American Vacuum Society.