多田 和也

Abstract Low-temperature formation of smooth and transparent rubrene films via thermal coalescence of particles deposited from surfactant-stabilized aqueous suspensions is demonstrated. While as-deposited films were porous with a high surface roughness, annealing at 160 °C, a temperature well below the bulk melting point but known to induce deoxygenation of photo-oxidized rubrene, transformed the film into a continuous layer. The results suggest that the presence of sodium dodecyl sulfate effectively facilitates molecular reorganization at the particle interfaces through eutectic-like phenomenon. This single-step annealing strategy potentially provides a practical route for integrating high-performance organic semiconductors into photonic devices through environmentally friendly water-based processing.