Researcher List Naoki Hayase Naoki Hayase (早勢 直紀) Please select the form format to download from below 「Education and research environment」format 「No. 4, the Ministry of Education document style ①Outline for Vitae」format 「No. 4, the Ministry of Education document style ②Education and research environment」format Profile Information AffiliationAssistant Professor,, Laboratory of Advanced Science and Technology for Industry, University of HyogoResearcher number81021631J-GLOBAL ID202501016447057391researchmap Member IDR000087817 Research Interests 2 Beyond EUV lithography EUV lithography Research History 3 Apr, 2025 - Present Laboratory of Advanced Science and Technology for Industry, University of Hyogo Nov, 2023 - Mar, 2025 National Institute of Information and Communications Technology Oct, 2020 - Oct, 2023 技術開発部, HOYA株式会社 Papers 1 Beyond EUV binary and phase shift masks simulation Naoki Hayase, Tetsuo Harada Proc. SPIE, Aug, 2024 Presentations 5 Background level theory for EUV multilayer deposition Naoki Hayase, Tetsuo Harada Photomask Japan 2025, Apr, 2025 Concept of EUV pulse width modulation Naoki Hayase The 21st IEEE TOWERS, Oct, 2024 Consolidated design approach to EUV mask blanks with TaBN based absorber Takahiro Onoue, Naoki Hayase, Kazutake Taniguchi, Hitoshi Maeda, Teiichiro Umezawa Photomask Technology 2023, Nov, 2023 Simulation study of Beyond-EUV mirrors for 6.7nm wavelength Naoki Hayase The 20th IEEE TOWERS, Oct, 2023 Feasibility study of alternative multilayer for EUV mask Teiichiro Umezawa, Yohei Ikebe, Naoki Hayase, Takahiro Onoue Photomask Technology 2022, Nov, 2022 Professional Memberships 2 2024 - Present Optica 2024 - Present SPIE
Naoki Hayase (早勢 直紀) Please select the form format to download from below 「Education and research environment」format 「No. 4, the Ministry of Education document style ①Outline for Vitae」format 「No. 4, the Ministry of Education document style ②Education and research environment」format Profile Information AffiliationAssistant Professor,, Laboratory of Advanced Science and Technology for Industry, University of HyogoResearcher number81021631J-GLOBAL ID202501016447057391researchmap Member IDR000087817 Research Interests 2 Beyond EUV lithography EUV lithography Research History 3 Apr, 2025 - Present Laboratory of Advanced Science and Technology for Industry, University of Hyogo Nov, 2023 - Mar, 2025 National Institute of Information and Communications Technology Oct, 2020 - Oct, 2023 技術開発部, HOYA株式会社 Papers 1 Beyond EUV binary and phase shift masks simulation Naoki Hayase, Tetsuo Harada Proc. SPIE, Aug, 2024 Presentations 5 Background level theory for EUV multilayer deposition Naoki Hayase, Tetsuo Harada Photomask Japan 2025, Apr, 2025 Concept of EUV pulse width modulation Naoki Hayase The 21st IEEE TOWERS, Oct, 2024 Consolidated design approach to EUV mask blanks with TaBN based absorber Takahiro Onoue, Naoki Hayase, Kazutake Taniguchi, Hitoshi Maeda, Teiichiro Umezawa Photomask Technology 2023, Nov, 2023 Simulation study of Beyond-EUV mirrors for 6.7nm wavelength Naoki Hayase The 20th IEEE TOWERS, Oct, 2023 Feasibility study of alternative multilayer for EUV mask Teiichiro Umezawa, Yohei Ikebe, Naoki Hayase, Takahiro Onoue Photomask Technology 2022, Nov, 2022 Professional Memberships 2 2024 - Present Optica 2024 - Present SPIE