Kazuya Emura, Takeo Watanabe, Masato Yamaguchi, Hirohito Tanino, Tsubasa Fukui, Daiju Shiono, Yuichi Haruyama, Yasuji Muramatsu, Katsumi Ohmori, Kazufumi Sato, Tetsuo Harada, Hiroo Kinoshita
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 27(5) 631-638 2014年 査読有り
Simultaneous achievement of high sensitivity and low line edge roughness (LWR) is necessary in EUV resist. The chemical reaction analysis of EUV (Extreme Ultraviolet) chemical amplified (CA) resist and acid diffusion length evaluation was carried out. In order to achieve low LWR of the CA resist, the large chemical structure of the anion of photoacid generator (PAG) is required for shortening the acid diffusion length. On the other hand, in order to increase the sensitivity, on the basis of the chemical reaction analysis using the soft x-ray absorption spectroscopy, the decomposition reaction of the large chemical structure of the PAG anion should be taken in account in addition of ionization reaction. However, if the decomposition reaction occur, the acid diffusion length will become shorter than that as expected. It is found that the Imidate-type of anion of PAG has high sensitivity and short diffusion length. The chemical reaction analysis by the soft x-ray absorption spectroscopy using the synchrotron radiation with the combination analysis of the acid diffusion are useful method for the mitigation of high sensitivity and low LWR.