研究者業績
Profile Information
- Affiliation
- Associate Professor, Laboratory of Advanced Science and Technology for Industry, University of Hyogo
- Degree
- Ph.D(Mar, 2019, Tokyo Institute of Technology)
- Researcher number
- 90876252
- J-GLOBAL ID
- 202001010541924789
- researchmap Member ID
- R000007020
- External link
Research Interests
6Research Areas
2Research History
3Education
3-
Apr, 2016 - Mar, 2019
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Apr, 2014 - Mar, 2016
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Apr, 2010 - Mar, 2014
Committee Memberships
1Awards
1Major Papers
17-
International Conference on Extreme Ultraviolet Lithography 2023, Nov 21, 2023 Lead authorCorresponding author
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Journal of Photopolymer Science and Technology, 36(1) 53-59, Jun 15, 2023 Peer-reviewedCorresponding author
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Characterization of Photoacid Generator Bound Resist with X-ray Absorption Spectroscopy at NewSUBARUJournal of Photopolymer Science and Technology, 36(1) 47-52, Jun 15, 2023 Peer-reviewedLead authorCorresponding author
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Journal of Photopolymer Science and Technology, 36(1) 41-45, Jun 15, 2023 Peer-reviewedCorresponding author
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Journal of Photopolymer Science and Technology, 35(1) 61-65, Dec 16, 2022 Peer-reviewedCorresponding author
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Journal of Photopolymer Science and Technology, 34(1) 111-115, Jun 11, 2021 Peer-reviewedLead authorCorresponding authorIn extreme ultraviolet (EUV) lithography development, the reduction of line width roughness (LWR) is a one of the significant issues. It has been reported that the LWR of photoacid generator (PAG) bounded resist is lower than that of PAG blended resist. It is considered that the chemical composition distribution of PAG bounded resist is more uniform than PAG blended resist. However, it has not been evaluated systematically and experimentally. In this study, we introduced the contact angle measurement method for the evaluation of the chemical composition distribution between PAG blended resist and PAG bounded resist. It is clarified that the resist thin film has a different chemical composition distribution from the center to the outside of wafer regardless of the type of resists. In particular, the chemical composition distribution of the bounded resist showed the opposite behavior to that the blended one.
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Reactive and Functional Polymers, 136 19-24, Mar, 2019 Peer-reviewedLead author
Major Misc.
7-
X線分析討論会講演要旨集, 58th, 2022 Corresponding author
Major Presentations
68-
International Conference on Extreme Ultraviolet Lithography 2024, Sep 30, 2024
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The 41st International Conference of Photopolymer Science and Technology, Jun 27, 2024
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International Conference on Extreme Ultraviolet Lithography 2023, Oct 2, 2023
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International Polymer Conference 2023, Jul, 2023
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Characterization of Photoacid Generator Bound Resist with X-Ray Absorption Spectroscopy at NewSUBARUThe 40th International Conference of Photopolymer Science and Technology, Jun, 2023
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The 40th International Conference of Photopolymer Science and Technology, Jun, 2023
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New Generation Lithography 2022, Jul, 2022
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The 39th International Conference of Photopolymer Science and Technology, Jun, 2022
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The 39th International Conference of Photopolymer Science and Technology, Jun, 2022
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New Generation Lithography 2021, Jul, 2021
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The 38th International Conference of Photopolymer Science and Technology, Jun, 2021
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International Congress on Membranes & Membrane Processes 2020, Dec, 2020
Teaching Experience
4-
Sep, 2021 - Present材料放射光実験III (兵庫県立大学)
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Sep, 2021 - Present放射光科学のフロンティア（オムニバス形式） (兵庫県立大学)
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Sep, 2021 - Present先端科学を学ぶ（副専攻集中講義） (兵庫県立大学)
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Oct, 2020 - Present機械・材料工学実験 (兵庫県立大学)
Professional Memberships
5-
Apr, 2024 - Present
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Jan, 2023 - Present
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Jul, 2021 - Present
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2020 - Present
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2014 - Present