研究者業績
  1. 研究者検索結果一覧
  2. 渡邊 健夫

渡邊 健夫

ワタナベ タケオ  (Takeo Watanabe)

基本情報

所属
兵庫県立大学 高度産業科学技術研究所 極端紫外線リソグラフィー研究開発センター 教授 (学長特別補佐（先端科学技術・異分野融合研究推進）、所長特別補佐、センター長)
学位
理学博士(1990年9月 大阪市立大学)
J-GLOBAL ID
200901004223661630
researchmap会員ID
1000214822
外部リンク

研究キーワード

 2

研究分野

 2

経歴

 18
もっとみる

学歴

 1

委員歴

 37
もっとみる

受賞

 6
もっとみる

論文

 310
もっとみる

MISC

 194
  • H Kinoshita, T Watanabe, M Niibe
    JOURNAL OF SYNCHROTRON RADIATION 5 320-325 1998年5月  
    Extreme ultraviolet lithography is a powerful tool for printing features of 0.1 mu m and below; in Japan and the USA there is a growing tendency to view it as the wave of the future. With Schwarzschild optics, replication of a 0.05 mu m pattern has been demonstrated in a 25 mu m square area. With a two-aspherical-mirror system, a 0.15 mu m pattern has been replicated in a ring slit area of 20 mm x 0.4 mm; a combination of this system with illumination optics and synchronized mask and wafer stages has enabled the replication of a 0.15 mu m pattern in an area of 10 mm x 12.5 mm. Furthermore, in the USA, the Sandia National Laboratory has succeeded in fabricating a fully operational NMOS transistor with a gate length of 0.1 mu m. The most challenging problem is the fabrication of mirrors with the required figure error of 0.28 nm. However, owing to advances in measurement technology, mirrors can now be made to a precision that almost satisfies this requirement. Therefore, it is time to move into a rapid development phase in order to obtain a system ready for practical use by the year 2004. In this paper the status of individual technologies is discussed in light of this situation, and future requirements for developing a practical system are considered.
  • H Kinoshita, Y Kimpara, T Watanabe, Y Platonov, JL Wood
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 37(5A) 2758-2761 1998年5月  
    We propose a multilayer-coated mirror for the first mirror of a beamline. Calculated reflectivities of over 80% for B4C/W and C/Ni constant d-spacing multilayer-coated mirrors are obtained at 6 keV. Moreover, by using the constant d-spacing multilayer-coated mirror, a monochromatic light source with high reflectivity and high resolution is obtained at the glancing angle of 1.5 degrees. Furthermore, it is determined that a graded d-spacing multilayer-coated mirror, i.e., a supermirror, is effective in this photon energy region since the half-width at half-maximum of the reflectivity increases. A multilayer-coated reflection mirror for beamline optics is promising for applications in microfabrication and structure analysis of materials.
  • A.Ando, S.Amano, S.Hashimoto, H.Kinoshita, S.Miyamoto, T.Mochizuki, M.Niibe, Y.Shoji, M.Terasawa, T.Watanabe, N.Kumagai
    J. Synchrotron Rad. 5 342-344 1998年  
  • 精密工学会誌 64(7) 979-984 1998年  
  • Society of Precision Engineering 64(7) 979-984 1998年  
  • H Kinoshita, T Watanabe, A Ozawa, M Niibe
    PHOTOMASK AND X-RAY MASK TECHNOLOGY V 3412 358-368 1998年  
    EUVL employs a reflective mask consisting of a metallized pattern (absorber) less than 100 nm thick on a state-of-the-art multilayer mirror (reflector) deposited on a substrate. The key technologies needed for mask fabrication are coating equipment to make defect-free multilayer films and a low-damage mask fabrication process. Current repair and inspection technologies are advanced enough to handle a pattern size of 0.3 mu m.
  • H Kinoshita, T Watanabe, M Niibe, M Ito, H Oizumi, H Yamanashi, K Murakami, T Oshino, Y Platonov, N Grupido
    EMERGING LITHOGRAPHIC TECHNOLOGIES II 3331 20-31 1998年  
    In order to investigate industrial applications of synchrotron radiation, Hyogo Prefecture is constructing a synchrotron radiation (SR) ring at the SPring-8 site. It will operate at an electron energy of 1.5 GeV. In September, 1998, the ring will be commissioned when th, SPring-8 injector begins feeding electrons into it. We developed a beamline for EUVL under the industrial applications program. In addition, we are developing a three-aspherical-mirror system for EUVL. The specifications of the exposure tool target the 0.1-mu m generation on the SIA road map. This tool consists of illumination optics, a scanning and alignment mechanism, 3-aspherical-mirror optics, and a load-lock chamber for exchanging wafers. The exposure tool is installed in a thermal chamber located at the end of the beamline. Using this system, we plan to develop a 0.1-mu m process and fabricate MOS devices with feature sizes of 0.1-mu m and below.
  • H Kinoshita, T Watanabe, A Ozawa, M Niibe
    PHOTOMASK AND X-RAY MASK TECHNOLOGY V 3412 358-368 1998年  
    EUVL employs a reflective mask consisting of a metallized pattern (absorber) less than 100 nm thick on a state-of-the-art multilayer mirror (reflector) deposited on a substrate. The key technologies needed for mask fabrication are coating equipment to make defect-free multilayer films and a low-damage mask fabrication process. Current repair and inspection technologies are advanced enough to handle a pattern size of 0.3 mu m.
  • H Kinoshita, Y Kimpara, T Uruga, T Watanabe, M Niibe, Y Platonov, JL Wood
    ADVANCES IN MIRROR TECHNOLOGY FOR SYNCHROTRON X-RAY AND LASER APPLICATIONS 3447 2-11 1998年  
    This paper describes the beamline optics for deep-etch X-ray lithography (LIGA). In order to obtain a higher reflectivity than that provided by a mirror with a monolayer coating at photon energies of 4 to 6 keV, multilayer mirrors with a constant and graded d-spacing were developed. At an energy of 6 keV, a measured reflectivity of more than 80% and a band width of 1 keV were obtained for a mirror with a Ni/C multilayer coating and a constant d-spacing. Moreover, it was found that, for energies from 4 to 6 keV, a multilayer mirror with a graded d-spacing provided a higher reflectivity and a wider bandwidth than a mirror with a Pt monolayer coating. A multilayer reflection mirror is a promising component of beamline optics for use in microfabrication and the structural analysis of materials.
  • T Watanabe, K Mashima, M Niibe, H Kinoshita
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 36(12B) 7597-7600 1997年12月  
    The demagnifying optics for extreme ultra-violet lithography (EUVL), which consists of three aspherical mirrors and one plane mirror, is proposed. A resolution of 0.1 mu m can be achieved on a ring field of 26 mm x 1mm in size and the blur size owing to the distortion is small. The assembly tolerance such as decentration tolerance and tilt tolerance is investigated for each of the aspherical mirrors. It is clarified that the assembly accuracy requires 0.0015 degree for the proposed optics.
  • J. Vac Sci Technol 15(6) 2582-2586 1997年11月  
  • T Kozawa, S Nagahara, Y Yoshida, S Tagawa, T Watanabe, Y Yamshita
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 15(6) 2582-2586 1997年11月  
    Radiation-induced reactions in chemically amplified resists based on deprotection of t-butoxycarbonyl groups have been investigated by both time-resolved (the pulse radiolysis methods) and steady-state optical absorption spectroscopy, Upon exposure of a partially tBOC-protected novolak by electron and synchrotron radiation beams, the yields of the intermediates contributing to the acid generation (phenoxyl radical and proton adducts of base resin) decreased with increasing the protection ratio of hydroxyl groups. Therefore, the efficiency of the acid generation is closely related with the protection ratio. The relation of the acid generation mechanism with the protection ratio was discussed. (C) 1997 American Vacuum Society.
  • Proc. 4th Int. Symp. Sputtering & Plasma Processes 7601-7604 1997年  
  • Hiroo Kinoshita, Takeo Watanabe
    Journal of Photopolymer Science and Technology 10(3) 369-376 1997年  
    EUV lithography is a powerful candidate to replicate 0.1 μm feature size below. In Japan and USA, there is a growing tendency to view EUV lithography as the wave of the future. Up to now, it has been confirmed that a diffraction limited pattern size of 0.05-μm can be replicated in an area of 25 μm square using Schwartzchild optics, and a 0.15-μm pattern has been realized in a ring field of 20 mm × 0.4 mm using a two-aspherical mirror system. And combination of this system, illumination optics and synchronized stage for mask and wafer, a fine pattern replication in a area of 10 mm × 12.5 mm has been succeeded. In USA, Sandia National Laboratory (SNL) group has demonstrated the fabrication of NMOS transistor with a minimum pattern size of 0.1 μm utilizing exposure tool for laboratory use. They are now in term of fabricating an exposure tool for practical use. If the practical exposure system is realized, we can use it for several generations for device fabrication. Therefore, we have to start rapid development, and a system for a practical use must be ready by 2004. Based on this situation, the status of individual technologies is discussed and future requirement for developing a practical system are considered. © 1997 TAPJ.
  • H Kinoshita, T Watanabe, M Koike, T Namioka
    MATERIALS, MANUFACTURING, AND MEASUREMENT FOR SYNCHROTRON RADIATION MIRRORS 3152 211-220 1997年  
    Manufacturing for large-scaled integrated circuit requires a large exposure area and high throughput. According to the SLA road map, 16 GbitDRAM requires exposure area of 26 mm x 44 mm for a 0.1-mu m generation. In order to determine these feasibility, we designed an imaging optics which is based on three aspherical-mirror optics for EUVL. This designed optics is very compact one, and the optics can achieve a resolution of less than 0.1 mu m and an ring field of 26 mm x 1.0 mm on a wafer. In assembling the demagnifying optical system, various adjustment errors such as decenter, tilt and despace affect one another in an intricate way and degrade the system performance in a complicated manner. It is therefore important in practice to adjust the system as a whole rather than trying to optimize the effects of individual adjustment mirrors on the resolution by fulfilling respective tolerances. Another important factor affecting the system performance is surface figure error of aspherical mirrors. The surface figure error of aspherical mirror is estimated by calculation of ray tracing method We obtained the tolerance of the figure errors of M1, M2, and M3 to be 0.66 nm, 0.75 nm, and 0.90 nm for replicating 0.1-mu m-pattern, respectively. It is found that these values are twice or three times larger than the values obtained from Marechal criteria.
  • Niibe Masahito, Watanabe Takeo, Kinoshita Hiroo
    Japanese Journal of Applied Physics 36(12B) 7601-7604 1997年  
    Mirrors for the imaging optics of extreme ultra-violet lithography (EUVL) systems require highly precise figure processing. We have examined a method of fabricating the aspherical surfaces by deposition. A film of graded thickness is deposited on a spherical substrate using an RF-plasma-enhanced magnetron sputtering system with a deposition mask. The distribution in thickness of the deposited film is close to the designed value, and the method was shown to be feasible for figuring aspherical surfaces. The deposition films for the method are required to have little surface roughness and low residual stress. We have compared the roughnesses and residual stresses in Mo single layer films and Mo/Si multilayer films used in mirrors for soft X-rays. Both values for Mo/Si multilayers were about one order of magnitude smaller than those for Mo single layer films. The roughness of Mo/Si multilayer films almost satisfies the required value for EUVL optics; however, further study is necessary to diminish the residual stress.
  • Proceedings of the Second US-Japan Workshop on Soft X-ray Optics, The Japan Society for Precision Engineering 541-545 1997年  
  • Proceedings of the Second US-Japan Workshop on Soft X-ray Optics, The Japan Society for Precision Engineering 341-348 1997年  
  • FEDジャーナル 7(2) 59-62 1996年  
  • FED Journal 7(2) 59-62 1996年  
  • S Mori, T Watanabe, K Adachi, T Fukushima, K Uda, Y Sato
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIII 2724 131-138 1996年  
    SiN substrate effect in chemically amplified (CA) resist has been investigated by surface analysis and evaluating the pattern profile of CA negative tone resist. Fine profile can be replicated on SiN substrate treated with oxygen plasma optimized condition. Undercut profile can be affected by adsorbed materials on SiN substrate from Thermal Desorption Spectroscopy (TDS) analysis results. From the results of Electron Spectroscopy for Chemical Analysis (ESCA),it is found that Si-N bonding is replaced to Si-O bonding while SiN substrate is treated with oxygen plasma. Relations between footing length and oxygen plasma treatment condition suggest that undercut profile due to the concentration of nitrogen on the surface of SiN substrate. At the interface between the SiN substrate and the CA resist, the SiN substrate works as base existing H2O, and quenchs photo-generated-acids. The mechanism of substrate effect of SiN is clarified. Reducing the SiN-substrate effect by treating the surface with oxygen plasma, fine resist pattern without undercut and footing is formed on SiN substrate.
  • S AOKI, SY BAHK, KS CHUNG, SH CHUNG, H FUNAHASHI, CH HAHN, T HARA, S HIRATA, K HOSHINO, M IEIRI, T IJIMA, K IMAI, Y ITOW, T JINYA, M KAZUNO, K KIKUCHI, CO KIM, DC KIM, JY KIM, K KODAMA, Y MAEDA, A MASAIKE, A MASUOKA, Y MATSUDA, C NAGOSHI, M NAKAMURA, S NAKANISHI, T NAKANO, K NAKAZAWA, K NIWA, H ODA, S OGAWA, SH OH, H OKABE, R OZAKI, IG PARK, MS PARK, Y SATO, H SHIBUYA, HM SHIMIZU, YB SIM, JS SONG, M SUGIMOTO, H TAJIMA, R TAKASHIMA, F TAKEUTCHI, KH TANAKA, R TANAKA, M TERANAKA, TEZUKA, I, H TOGAWA, N USHIDA, T WATANABE, N YASUDA, J YOKOTA, CS YOON
    PHYSICS LETTERS B 355(1-2) 45-51 1995年7月  
    An event accompanied by two single hyperfragments emitted from a Xi(-) nuclear capture at rest was found in a nuclear emulsion. It is interpreted as a Xi(-)-C-12 bound system decaying into either a)(Lambda)H-4 + Be-9(Lambda), b) H-4(Lambda) + Be-9(Lambda)* or c) H-4(Lambda)* + Be-9(Lambda). The binding energy of the Xi-C-12 system is obtained as a/) 3.70(-0.19)+(0.18) MeV, b) 0.62(-0.19)(+0.1)8 MeV and c) 2.66(-0.19)(+0.18) MeV, respectively. The system is considered as a Xi- hypernucleus in the cases a) and c). In case b), this event and another event of the same type (Yokohama event) can both be interpreted as a decay from the Xi-C-12 system in 2P state when a shallow Xi(-)-nulcear potential is assumed.
  • Takahiro Kozawa, Mitsuru Uesaka, Takeo Watanabe, Yoshio Yamashita, Yoichi Yoshida, Seiichi Tagawa
    Journal of Photopolymer Science and Technology 8(1) 37-42 1995年  
    Radiation-induced reactions in novolak-based chemically amplified resists have been studied by means of pulse radiolysis in the time ranges from the order of picoseconds to that of minutes. In the chemically amplified electron beam and X-ray resists, the electron scavenging effect of onium salts delays the recombination of cationic intermediates with electrons and prolongs the lifetime of the cationic intermediates. The absorption due to an phenoxyl radical of novolak was observed at 400nm by electron beam exposure. It is thought that the proton adducts and phenoxyl radicals of novolak were formed by ion-molecular reactions between novolak and its radical cations. Furthermore, long-lived intermediates were observed in the novolak-based chemically amplified resists. © 1995, The Society of Photopolymer Science and Technology(SPST). All rights reserved.
  • T WATANABE, Y YAMASHITA, T KOZAWA, Y YOSHIDA, S TAGAWA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 12(6) 3879-3883 1994年11月  
  • 大阪大学産業科学研究所付属放射線実験所 平成5年度年報 72-73 1994年  
  • United States Patent 5,326,672 1994年  
  • ACS Symposium Series Polymeric Materials for Microelectronic Applications : Science and Technology 579(15-19) 110-120 1994年  
  • T WATANABE, Y YAMASHITA, T KOZAWA, Y YOSHIDA, S TAGAWA
    POLYMERIC MATERIALS FOR MICROELECTRONIC APPLICATIONS 579(15-19) 110-120 1994年  
    A new interpretation of radiation-induced acid generation processes in polymer films is reported. For the investigation of the acid generation in chemically amplified resist films we employed a model system. In order to analyze the acid generation process, we utilized the visible absorption characteristics from a conventional spectrophotometer and a nanosecond pulse radiolysis system. The acid generation mechanisms of triphenylsulfonium triflate in m-cresol novolac and p-cresol novolac systems are discussed on the basis of absorption spectra. The acid-catalyzed reaction during post-exposure bake is also discussed in terms of the absorption spectra of the m-cresol novolac system.
  • Yoshio Yamashita, Mitsuaki Morigami, Takeo Watanabe, Shuji Fujiwara, Junichi Nishino
    Journal of Photopolymer Science and Technology 7(3) 551-560 1994年  
    The pattern replication characteristics in X-ray proximity lithography were investigated. Replication accuracy was evaluated as a function of proximity gap, pattern size and pattern density. It is found that 0.15 µm lines and spaces can be delineated in the wide proximity gap range of 40 µm and that 0.2-µm-level pattern replication minimally depends on the pattern density. The 0.25-µm-level critical dimension (CD) of the resist pattern was measured over a 6” wafer and the CD variation (3σ) was 0.0134 µm or ±5.4% for the linewidth. The resolution limit of X-ray proximity printing is discussed. Calculation results demonstrate that X-ray lithography has a high resolution of less than 0.1 µm. Resolution of 0.1 µm is confirmed by experimental results. © 1994, The Society of Photopolymer Science and Technology(SPST). All rights reserved.
  • Hiroshi Nagata, Masayuki Ohtani, Katsuhiko Murakami, Tetsuya Oshino, Hiroaki Oizumi, Yukihiko Maejima, Takeo Watanabe, Takao Taguchi, Yoshio Yamashita, Nobufumi Atoda
    Japanese Journal of Applied Physics 33(1R) 360-363 1994年  
    Soft X-ray projection lithography with a reduction rate of 32 was examined using Mo/Si-multilayer-coated Schwarzschild optics. The optics were designed to function at 13 nm, and were aligned with the synchrotron radiation light source. The patterns on a transmission mask were imaged in a 0.18-µm-thick polymethyl methacrylate resist. Line-and-space patterns down to 0.1 µ m were fabricated. © 1994 IOP Publishing Ltd.
  • H OIZUMI, Y MAEJIMA, T WATANABE, T TAGUCHI, Y YAMASHITA, N ATODA, K MURAKAMI, M OHTANI, H NAGATA
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS 32(12B) 5914-5917 1993年12月  
    Poly (methylmethacrylate) (PMMA), resist performance for soft X-ray projection lithography (SXPL) at an exposure wavelength of 13 nm was investigated with an special emphasis on development condition dependence. The resist contrast value gamma for 13 nm SXPL showed strong dependence on the developer, in contrast with proximity X-ray lithography (XRL) at the peak-wavelength of 0.7 nm. With an optimized developer, a resolution as high as 0.05 mum was achieved. A wide focus range of 1.5 mum with a 0.1 mum line-and-space pattern was also confirmed.
  • T TANAKA, M MORIGAMI, T WATANABE, M FUTAGAMI, K OKADA, S FUJIWARA, Y YAMAOKA, M HARADA, K KANEDA, J NISHINO, S SUZUKI
    MICROELECTRONIC ENGINEERING 20(4) 277-289 1993年12月  
    The replicated pattern distortion for feature sizes down to 0.15 mum, characterized by pattern linearity, pattern density dependence, and corner rounding, is investigated in synchrotron radiation (SR) lithography. In the investigation, a highly accurate X-ray mask delineated by a focused ion beam, a chemically amplified resist, and a Fresnel diffraction model simulator are used. At a 15 mum mask-to-wafer gap, no pattern proximity effect is observed. The corner rounding radius due to Fresnel diffraction is approximately 0.04 mum.
  • M MORIGAMI, T TANAKA, T WATANABE, Y YAMASHITA, S FUJIWARA, J NISHINO, M HARADA, Y YAMAOKA, R YUASA, M INAI, S SUZUKI
    ELECTRON-BEAM, X-RAY, AND ION-BEAM SUBMICROMETER LITHOGRAPHIES FOR MANUFACTURING III 1924 290-297 1993年  
  • H NAGATA, M OHTANI, K MURAKAMI, T OSHINO, Y MAEJIMA, T TANAKA, T WATANABE, Y YAMASHITA, N ATODA
    OSA PROCEEDINGS ON SOFT X-RAY PROJECTION LITHOGRAPHY 18 83-86 1993年  
  • Aoki S., BAHK S.Y., CHUNG K.S., CHUNG S.H., FUNAHASHI H., HAHN C.H., HARA T., HIRATA S., HOSHINO K., IEIRI M., IIJIMA T., IMAI K., ITOW Y., JIN-YA T., KAZUNO M., KIKUCHI K., KIM C.O., KIM D.C., KIM J.Y., KODAMA K., MAEDA Y., MASAIKE A., MASUOKA A., MATSUDA Y., NAGOSHI C., NAKAMURA M., NAKANISHI S., NAKANO T., NAKAZAWA K., NIWA K., ODA H., OKABE H., ONO S., OZAKI R., PARK I.G., PARK M.S., SATO Y., SHIBUYA H., SHIMIZU H.M., SONG J.S., SUGIMOTO M., TAIRADATE M., TAJIMA H., TAKASHIMA R., TAKEUTCHI F., TANAKA K.H., TERANAKA M., TEZUKA I., TOGAWA H., USHIDA N., WATANABE T., YASUDA N., YOKOTA J., YOON C.S., Department of Physics Nagoya University, Wonkang University, Gyeongsang National University, Gyeongsang National University, Department of Physics Kyoto University, Changwon National University, College of Liberal Arts Kobe University, Department of Physics Kyoto University, Department of Physics Nagoya University, KEK National Laboratory for High Energy Physics, Department of Physics Kyoto University, Department of Physics Kyoto University, Department of Physics Kyoto University, Department of Physics Toho University, Department of Physics Toho University, Faculty of Education Utsunomiya University, Korea University, Gyeongsang National University, Chonnam National University, Aichi University of Education, Faculty of Education Yokohama National University, Department of Physics Kyoto University, Aichi University of Education, College of Liberal Arts Kobe University, Institute for Nuclear Study University of Tokyo, Department of Physics Nagoya University, Department of Physics Nagoya University, Department of Physics Kyoto University, Physcs Department Gifu University, Department of Physics Nagoya University, Aichi University of Education, Science Education Institute of Osaka Prefecture, Department of Physics Toho University, Physcs Department Gifu University, Gyeongsang National University, Gyeongsang National University, Faculty of Education Utsunomiya University, Department of Physics Toho University, Department of Physics Kyoto University, Gyeongsang National University, Faculty Of Education Yokohama National University, Department of Physics Toho University, Department of Physics Nagoya University, Kyoto University of Education, Faculty of Science Kyoto Sangyo University, KEK National Laboratory for High Energy Physics, Department of Physics Osaka City University, Faculty of Education Utsunomiya University, Department of Physics Kyoto University, Aichi University of Education, Department of Physics Osaka City University, Faculty of Education Utsunomiya University, Science Education Institute of Osaka Prefecture, Gyeongsang National University
    Progress of theoretical physics = Progress of theoretical physics 89(2) 493-500 1993年  
    The S=-2 hypernuclear states formed through (K^-, K^+) reactions have been studied by using the 1.66 GeV/c K^- beam provided by KEK Proton Synchrotron. Investigation has been done on the stars due to the capture of the Ξ^- hyperons at rest in nuclear emulsion, which hyperons were produced in (K^-, K^+) reactions. We observed a clear case of an absorption of Ξ^- hyperon at rest by a nucleus followed by a back-to-back emission of two single-Λ hypernuclei.
  • K. Kodama, N. Ushida, A. Mokhtarani, V. S. Paolone, J. T. Volk, J. O. Wilcox, P. M. Yager, R. M. Edelstein, A. P. Freyberger, D. B. Gibaut, R. J. Lipton, W. R. Nichols, D. M. Potter, J. S. Russ, Y. Zhang, H. I. Jang, J. Y. Kim, T. I. Kim, I. T. Lim, M. Y. Pac, B. R. Baller, R. J. Stefanski, K. Nakazawa, S. Tasaka, K. S. Chung, S. H. Chung, D. C. Kim, I. G. Park, M. S. Park, J. S. Song, C. S. Yoon, M. Chikawa, T. Abe, T. Fujii, G. Fujioka, K. Fujiwara, H. Fukushima, T. Hara, Y. Takahashi, K. Taruma, Y. Tsuzuki, C. Yokoyama, S. D. Chang, B. G. Cheon, J. H. Cho, J. S. Kang, C. O. Kim, K. Y. Kim, T. Y. Kim, J. C. Lee, S. B. Lee, G. Y. Lim, S. W. Nam, T. S. Shin, K. S. Sim, J. K. Woo, Y. Isokane, Y. Tsuneoka, S. Aoki, A. Gauthier, K. Hoshino, H. Kitamura, M. Kobayashi, M. Miyanishi, K. Nakamura, M. Nakamura, Y. Nakamura, S. Nakanishi, K. Niu, K. Niwa, H. Tajima, J. M. Dunlea, S. G. Frederiksen, S. Kuramata, B. G. Lundberg, G. A. Oleynik, N. W. Reay, K. Reibel, R. A. Sidwell, N. R. Stanton, K. Moriyama, H. Shibata, G. R. Kalbfleisch, P. Skubic, J. M. Snow, S. E. Willis, W. Y. Yuan, O. Kusumoto, T. Okusawa, M. Teranaka, T. Tominaga, T. Watanabe, J. Yamato, H. Okabe, J. Yokota, M. Adachi, M. Kazuno, F. Minakawa, E. Niu, H. Shibuya, S. Watanabe, O. Fukuda, Y. Sato, I. Tezuka, S. Y. Bahk, S. K. Kim
    Physics Letters B 263(3-4) 579-583 1991年7月18日  
    We present results on charm pair correlations measured in proton-emulsion interactions at s=38.7 GeV. The predictions of leading order QCD for the distributions in invariant mass, rapidity gap, xF, and polar angle in the charm pair CMS are qualitatively consistent with our measurements. The mean pT of the pairs is equal within errors to that measured in dilepton production at the same energy and mass range. © 1991.
  • K. Kodama, N. Ushida, A. Mokhtarani, V. S. Paolone, J. T. Volk, J. O. Wilcox, P. M. Yager, R. M. Edelstein, A. P. Freyberger, D. B. Gibaut, R. J. Lipton, W. R. Nichols, D. M. Potter, J. S. Russ, Y. Zhang, H. I. Jang, J. Y. Kim, T. I. Kim, I. T. Lim, M. Y. Pac, B. R. Baller, R. J. Stefanski, K. Nakazawa, S. Tasaka, K. S. Chung, S. H. Chung, D. C. Kim, I. G. Park, M. S. Park, J. S. Song, C. S. Yoon, M. Chikawa, T. Abe, T. Fujii, G. Fujioka, K. Fujiwara, H. Fukushima, T. Hara, Y. Takahashi, K. Taruma, Y. Tsuzuki, C. Yokoyama, S. D. Chang, B. G. Cheon, J. H. Cho, J. S. Kang, C. O. Kim, K. Y. Kim, T. Y. Kim, J. C. Lee, S. B. Lee, G. Y. Lim, S. W. Nam, T. S. Shin, K. S. Sim, J. K. Woo, Y. Isokane, Y. Tsuneoka, s. Aoki, A. Gauthier, K. Hoshino, H. Kitamura, M. Kobayashi, M. Miyanishi, K. Nakamura, M. Nakamura, Y. Nakamura, S. Nakanishi, K. Niu, K. Niwa, H. Tajima, J. M. Dunlea, S. G. Frederiksen, S. Kuramata, B. G. Lundberg, G. A. Oleynik, N. W. Reay, K. Reibel, R. A. Sidwell, N. R. Stanton, K. Moriyama, H. Shibata, G. R. Kalbfleisch, P. Skubic, J. M. Snow, S. E. Willis, W. Y. Yuan, O. Kusumoto, T. Okusawa, M. Teranaka, T. Tominaga, T. Watanabe, J. Yamato, H. Okabe, J. Yokota, M. Adachi, M. Kazuno, F. Minakawa, E. Niu, H. Shibuya, S. Watanabe, O. Fukuda, Y. Sato, I. Tezuka, S. Y. Bahk, S. K. Kim
    Physics Letters B 263(3-4) 573-578 1991年7月18日  
    We report results on D0 and D+ production in proton-emulsion interactions at s=38.7 GeV. A fit to the form (1-|xF|)n exp (-bp 2 T) yields n=6.9 +1.9 -1.8 and b=0.84 +0.10 -0.08(GeV/c)-2. The total inclusive cross section, is assuming linear A dependence, is measured to be 38±3(stat.) ±13 (sys.) μb for the D0 and 38±9±14 μb for the D+. A comparison of these results with previous measurements indicates that nuclear effects do not strongly influence charm production. The predictions of QCD are in good agreement with our data. © 1991.
  • S AOKI, SY BAHK, KS CHUNG, SH CHUNG, H FUNAHASHI, CH HAHN, T HARA, S HIRATA, K HOSHINO, M IEIRI, T IIJIMA, K IMAI, T ISHIGAMI, Y ITOW, M KAZUNO, K KIKUCHI, CO KIM, DC KIM, JY KIM, M KOBAYASHI, K KODAMA, Y MAEDA, A MASAIKE, A MASUOKA, Y MATSUDA, C NAGOSHI, M NAKAMURA, S NAKANISHI, T NAKANO, K NAKAZAWA, K NIWA, H ODA, H OKABE, S ONO, R OZAKI, IG PARK, Y SATO, H SHIBUYA, HM SHIMIZU, JS SONG, M SUGIMOTO, H TAJIMA, R TAKASHIMA, F TAKEUTCHI, KH TANAKA, M TERANAKA, TEZUKA, I, H TOGAWA, N USHIDA, S WATANABE, T WATANABE, J YOKOTA, CS YOON
    PROGRESS OF THEORETICAL PHYSICS 85(6) 1287-1298 1991年6月  
    We have studied stars in nuclear emulsion due to the capture at rest of the KELVIN- hyperons produced in the (K-,K+) reaction. The sequential weak decay of a double hypernucleus (nucleus with S = -2) has been directly observed. The double hypernucleus is assigned as either LAMBDA-LAMBDA-Be-10 or LAMBDA-LAMBDA-B-13. This assignment excludes the existence of the H dibaryon lighter than 2203.7 +/- O.7 MeV/c2.
  • S AOKI, SY BAHK, KS CHUNG, SH CHUNG, H FUNAHASHI, CH HAHN, T HARA, S HIRATA, K HOSHINO, M IEIRI, T IIJIMA, K IMAI, T ISHIGAMI, Y ITOW, M KAZUNO, K KIKUCHI, CO KIM, DC KIM, JY KIM, M KOBAYASHI, K KODAMA, Y MAEDA, A MASAIKE, A MASUOKA, Y MATSUDA, C NAGOSHI, M NAKAMURA, S NAKANISHI, T NAKANO, K NAKAZAWA, K NIWA, H ODA, H OKABE, S ONO, R OZAKI, IG PARK, Y SATO, H SHIBUYA, HM SHIMIZU, JS SONG, M SUGIMOTO, H TAJIMA, R TAKASHIMA, F TAKEUTCHI, KH TANAKA, M TERANAKA, TEZUKA, I, H TOGAWA, N USHIDA, S WATANABE, T WATANABE, J YOKOTA, CS YOON
    PROGRESS OF THEORETICAL PHYSICS 85(5) 951-956 1991年5月  
    We have studied 80 events of candidates for XI-capture star at rest in nuclear emulsion, where XI- hyperons are produced in (K-, K+) reactions identified by a K+ spectrometer. The weak decay of heavy double hypernuclei is confirmed, studying the distribution of visible energy-release and the probability of emission of two fast protons, in comparison with those for single hypernuclei.
  • K KODAMA, N USHIDA, A MOKHTARANI, VS PAOLONE, JT VOLK, JO WILCOX, PM YAGER, RM EDELSTEIN, AP FREYBERGER, DB GIBAUT, RJ LIPTON, WR NICHOLS, DM POTTER, JS RUSS, Y ZHANG, HI JANG, JY KIM, IT LIM, MY PAC, BR BALLER, RJ STEFANSKI, K NAKAZAWA, S TASAKA, YS CHOI, KH CHUNG, DC KIM, IG PARK, JS SONG, CS YOON, M CHIKAWA, T ABE, T FUJII, G FUJIOKA, K FUJIWARA, H FUKUSHIMA, T HARA, Y TAKAHASHI, K TARUMA, Y TSUZUKI, C YOKOYAMA, SD CHANG, BG CHEON, JH CHO, JS KANG, CO KIM, KY KIM, TY KIM, JC LEE, SB LEE, GY LIM, SW NAM, TS SHIN, KS SIM, JK WOO, Y ISOKANE, Y TSUNEOKA, S AOKI, A GAUTHIER, K HOSHINO, H KITAMURA, M KOBAYASHI, M MIYANISHI, K NAKAMURA, M NAKAMURA, Y NAKAMURA, S NAKANISHI, K NIU, K NIWA, H TAJIMA, JM DUNLEA, SG FREDERIKSEN, S KURAMATA, BG LUNDBERG, GA OLEYNIK, NW REAY, K REIBEL, RA SIDWELL, NR STANTON, K MORIYAMA, H SHIBATA, TS JAFFERY, GR KALBFLEISCH, PL SKUBIC, JM SNOW, SE WILLIS, WY YUAN, O KUSUMOTO, T OKUSAWA, M TERANAKA, T TOMINAGA, T WATANABE, J YAMATO, H OKABE, J YOKOTA, M ADACHI, M KAZUNO, F MINAKAWA, E NIU, H SHIBUYA, S WATANABE, O FUKUDA, Y SATO, TEZUKA, I, SY BAHK, SK KIM
    PHYSICAL REVIEW LETTERS 66(14) 1819-1822 1991年4月  
    The fraction f of D0 semimuonic decays which occur through the K-mu-v mode has been measured in a hybrid emulsion spectrometer. Analysis of 124 semimuonic D0-decay candidates gives f = 0.32 +/- 0.05(stat) +/- 0.05(syst). From this measurement and existing data on the D0 semileptonic branching ratio and lifetime, we obtain the branching ratio R(D0 --> K- mu+v) = (2.4 +/- 0.4 +/- 0.5)% and partial decay rate-GAMMA(D0 --> K- mu+v) = (5.6 +/- 0.9 +/- 1.2) x 10(10) s-1.
  • Phys. Rev. Lett. 65(14) 1729-1732 1990年10月  
  • S AOKI, SY BAHK, KS CHUNG, SH CHUNG, H FUNAHASHI, CH HAHN, T HARA, S HIRATA, K HOSHINO, M IEIRI, T IIJIMA, K IMAI, T ISHIGAMI, Y ITOW, M KAZUNO, K KIKUCHI, CO KIM, DC KIM, JY KIM, M KOBAYASHI, K KODAMA, Y MAEDA, A MASAIKE, Y MATSUDA, C NAGOSHI, M NAKAMURA, S NAKANISHI, T NAKANO, K NAKAZAWA, K NIWA, H OKABE, S ONO, IG PARK, Y SATO, H SHIBUYA, HM SHIMIZU, JS SONG, H TAJIMA, R TAKASHIMA, F TAKEUTCHI, KH TANAKA, M TERANAKA, TEZUKA, I, H TOGAWA, Y UEDA, N USHIDA, S WATANABE, T WATANABE, J YOKOTA, CS YOON
    PHYSICAL REVIEW LETTERS 65(14) 1729-1732 1990年10月  
  • Necl. Instrum. Methods 289(1-2) 146-167 1990年4月  
  • K KODAMA, N USHIDA, RL LANDER, A MOKHTARANI, VS PAOLONE, JO WILCOX, PM YAGER, RM EDELSTEIN, AP FREYBERGER, DB GIBAUT, RJ LIPTON, WR NICHOLS, DM POTTER, RUSS, JR, Y ZHANG, HI JANG, JY KIM, MY PAC, BR BALLER, RJ STEFANSKI, K NAKAZAWA, S TASAKA, YS CHOI, KH CHUNG, DC KIM, IG PARK, JS SONG, CS YOON, M CHIKAWA, T ABE, T FUJII, G FUJIOKA, K FUJIWARA, H FUKUSHIMA, T HARA, Y TAKAHASHI, K TARUMA, Y TSUZUKI, C YOKOYAMA, SD CHANG, BG CHEON, JH CHO, JS KANG, CO KIM, KY KIM, TY KIM, JC LEE, SB LEE, GY LIM, IT LIM, SW NAM, TS SHIN, KS SIM, JK WOO, Y ISOKANE, Y TSUNEOKA, S AOKI, A GAUTHIER, K HOSHINO, H KITAMURA, M KOBAYASHI, M MIYANISHI, K NAKAMURA, M NAKAMURA, Y NAKAMURA, S NAKANISHI, K NIU, K NIWA, H TAJIMA, JM DUNLEA, SG FREDERIKSEN, S KURAMATA, BG LUNDBERG, GA OLEYNIK, NW REAY, K REIBEL, CJ RUSH, RA SIDWELL, NR STANTON, K MORIYAMA, H SHIBATA, TS JAFFERY, GR KALBFLEISCH, PL SKUBIC, JM SNOW, SE WILLIS, WY YUAN, O KUSUMOTO, T OKUSAWA, M TERANAKA, T TOMINAGA, T WATANABE, J YAMATO, H OKABE, J YOKOTA, M KAZUNO, F MINAKAWA, E NIU, S ONO, H SHIBUYA, S WATANABE, Y SATO, TEZUKA, I, SY BAHK, SK KIM
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT 289(1-2) 146-167 1990年4月  

書籍等出版物

 27
もっとみる

講演・口頭発表等

 882
もっとみる

所属学協会

 11
もっとみる

Works(作品等)

 3

共同研究・競争的資金等の研究課題

 11
もっとみる

産業財産権

 35
もっとみる

メディア報道

 46
もっとみる
一覧へ戻る