原田哲男

ハラダテツヲ (Tetsuo Harada)

基本情報

所属: 兵庫県立大学高度産業科学技術研究所教授

学位: 博士（工学）

J-GLOBAL ID: 201801018052844104
researchmap会員ID: B000326989

研究キーワード

研究分野

エネルギー / 量子ビーム科学 /

経歴

もっとみる

学歴

2003年10月 - 2007年3月

東北大学大学院工学研究科応用物理学専攻博士課程後期３年の課程
2001年4月 - 2003年9月

東北大学大学院工学研究科応用物理学専攻博士課程前期２年の課程
1997年4月 - 2001年3月

東北大学工学部

論文

146

Investigation of solvent effects on the distribution of resist compositions using resonant soft X-ray scattering

Kouji Kuramoto, Yuri Ebuchi, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe

JAPANESE JOURNAL OF APPLIED PHYSICS 64(6) 2025年6月1日
Development of an EUV irradiation tool in hydrogen atmosphere to evaluate EUV mask absorber durability

Hayato Ishida, Shinji Yamakawa, Tetsuo Harada

JAPANESE JOURNAL OF APPLIED PHYSICS 64(3) 2025年3月1日
Nanoscale Resist-Pattern Defects Clustered in the Micron Region Found by Soft X-ray Microscopy

Takeharu Motokawa, Shuhei Iguchi, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 38(2) 145-150 2025年
Spatial Distribution Analysis of Functional Groups in Resist Thin Film Using Reflection-Mode Resonant Soft X-ray Scattering

Yuri Ebuchi, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe

Journal of Photopolymer Science and Technology 37(6) 591-595 2024年12月25日
Observation Result of Chemical Composition Distribution of Resist Thin Film by Photoemission Electron Microscopy

Tsukasa Sasakura, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe

Journal of Photopolymer Science and Technology 37(6) 585-590 2024年12月25日
Current Status of EUV Flood Exposure Tool at NewSUBARU BL03

Ryuta Shiga, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe

Journal of Photopolymer Science and Technology 37(6) 579-584 2024年12月25日
EUV durability of CNT pellicles for next-generation scanner

Takahiro Ueda, Marcio D. Lima, Tetsuo Harada, Takeo Watanabe, Takeshi Kondo

Japanese Journal of Applied Physics 63(3) 2024年3月1日
Fundamental Evaluation of KrF Resist Changing Formulation by EB and EUV Exposure

Yosuke Ohta, Atsushi Sekiguchi, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe, Hiroki Yamamoto

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 37(1) 89-93 2024年
Evaluation of Basic Behavior of Acrylic Polymer Changing Composition by KrF, ArF and EUV Exposure

Yosuke Ohta, Atsushi Sekiguchi, Tadayuki Fujiwara, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe, Hiroki Yamamoto

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 37(3) 299-304 2024年
Carbon/boron multilayer for beyond EUV lithography

Umi Fujimoto, Tetsuo Harada, Shinji Yamakawa, Takeo Watanabe

Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology 2023年9月29日
Present Status of EUV Interference Lithography at NewSUBARU

Rikuya Imai, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe

Journal of Photopolymer Science and Technology 36(1) 53-59 2023年6月15日
Characterization of Photoacid Generator Bound Resist with X-ray Absorption Spectroscopy at NewSUBARU

Shinji Yamakawa, Tetsuo Harada, Koji Nakanishi, Takeo Watanabe

Journal of Photopolymer Science and Technology 36(1) 47-52 2023年6月15日
Spatial Distribution Analysis of Polymers in Resist Thin Film by Reflection-mode Resonant Soft X-ray Scattering

Atsunori Nakamoto, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe

Journal of Photopolymer Science and Technology 36(1) 41-45 2023年6月15日
Spatial Distribution Imaging of Resist Thin Film with Micrometer Resolution using Reflection Type Soft X-ray Projection Microscope

Shuhei Iguchi, Tetsuo Harada, Shinji Yamakawa, Takeo Watanabe, Takeharu Motokawa

Journal of Photopolymer Science and Technology 36(1) 25-30 2023年6月15日
CNT-based pellicles for the next generation of EUV scanners

Takahiro Ueda, Marcio D. Lima, Tetsuo Harada, Takeshi Kondo

JAPANESE JOURNAL OF APPLIED PHYSICS 62(SG) 2023年6月
Comparison of photoresist sensitivity between KrF, EB and EUV exposure

Yosuke Ohta, Atsushi Sekiguchi, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe, Hiroki Yamamoto

INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2023 12750 2023年
The X-ray absorption spectroscopy analysis of the negative-Tone PAG bound resist

Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe

Proceedings of SPIE - The International Society for Optical Engineering 12750 2023年
Comparison of Photoresist Sensitivity between KrF, EB and EUV Exposure

Yosuke Ohta, Atsushi Sekiguchi, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe, Hiroki Yamamoto

Journal of Photopolymer Science and Technology 35(1) 49-54 2022年12月16日査読有り
Grazing-Incidence Soft-X-ray Scattering for the Chemical Structure Size Distribution Analysis in EUV Resist

Atsunori Nakamoto, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe

Journal of Photopolymer Science and Technology 35(1) 61-65 2022年12月16日査読有り
R&D Activities of EUV Lithography at NewSUBARU, and Possibility of Beyond EUV

Takeo Watanabe, Tetsuo Harada, Shinji Yamakawa

Optics InfoBase Conference Papers 2022年
The measurement of the refractive index n and extinction coefficient k values of the EUV resist using EUV reflectivity measurement method

A. Sekiguchi, Y. Ohta, T. Harada, T. Watanabe

Proceedings of SPIE - The International Society for Optical Engineering 12292 2022年
Development of a high-power EUV irradiation tool in a hydrogen atmosphere

Tetsuo Harada, Shinji Yamakawa, Mitsunori Toyoda, Takeo Watanabe

JAPANESE JOURNAL OF APPLIED PHYSICS 60(8) 2021年8月
Modified-edge-support heat treatment method of polyimide for crystalline, large-area, and self-standing ultrathin graphite films

Kensuke Murashima, Yuki Kawashima, Shuhei Ozaki, Atsushi Tatami, Masamitsu Tachibana, Takeo Watanabe, Tetsuo Harada, Mutsuaki Murakami

CARBON 181 348-357 2021年8月
A Global Shutter Wide Dynamic Range Soft X-Ray CMOS Image Sensor With Backside-Illuminated Pinned Photodiode, Two-Stage Lateral Overflow Integration Capacitor, and Voltage Domain Memory Bank

Hiroya Shike, Rihito Kuroda, Ryota Kobayashi, Maasa Murata, Yasuyuki Fujihara, Manabu Suzuki, Shoma Harada, Taku Shibaguchi, Naoya Kuriyama, Takaki Hatsui, Jun Miyawaki, Tetsuo Harada, Yuichi Yamasaki, Takeo Watanabe, Yoshihisa Harada, Shigetoshi Sugawa

IEEE TRANSACTIONS ON ELECTRON DEVICES 68(4) 2056-2063 2021年4月
Beyond EUV measurement at NewSUBARU synchrotron light facility

Takuto Fujii, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe

Proceedings of SPIE - The International Society for Optical Engineering 11908 2021年
Hydrogen damage and cleaning evaluation of Mo/Si multilayer using high-power EUV irradiation tool

Tetsuo Harada, Ayato Ohgata, Shinji Yamakawa, Takeo Watanabe

Proceedings of SPIE - The International Society for Optical Engineering 11908 2021年
Fundamental research activities on EUV lithography at NewSUBARU synchrotron light facility

T. Watanabe, T. Harada, S. Yamakawa

Proceedings of SPIE - The International Society for Optical Engineering 11908 2021年
Damage-less removal of surface contamination using atomic hydrogen generated on heated tungsten mesh

Akira Heya, Tetsuo Harada, Masahito Niibe, Koji Sumitomo, Takeo Watanabe

Proceedings of SPIE - The International Society for Optical Engineering 11908 2021年
The Measurement of the Refractive Index n and k Value of the EUV Resist by EUV Reflectivity Measurement Method

Yosuke Ohta, Atsushi Sekiguchi, Tetsuo Harada, Takeo Watanabe

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 34(1) 105-110 2021年
Fundamental Evaluation of Resist on EUV Lithography at NewSUBARU Synchrotron Light Facility

Takeo Watanabe, Tetsuo Harada, Shinji Yamakawa

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 34(1) 49-53 2021年
Affinity Analysis of Photoacid Generator in the Thin Film of Chemical Amplification Resist by Contact Angle Measurement

Shinji Yamakawa, Ako Yamamoto, Seiji Yasui, Takeo Watanabe, Tetsuo Harada

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 34(1) 111-115 2021年
A global shutter wide dynamic range soft X-ray CMOS image sensor with BSI pinned photodiode, two-stage LOFIC and voltage domain memory bank

H. Shike, R. Kuroda, R. Kobayashi, M. Murata, Y. Fujihara, M. Suzuki, T. Shibaguchi, N. Kuriyama, J. Miyawaki, T. Harada, Y. Yamasaki, T. Watanabe, Y. Harada, S. Sugawa

Technical Digest - International Electron Devices Meeting, IEDM 2020-December 16.4.1-16.4.4 2020年12月12日
Fundamental research activities of euv lithography at newsubaru synchrotron light facility

Takeo Watanabe, Tetsuo Harada

Optics InfoBase Conference Papers 2020年11月16日
Resist pattern inspection for defect reduction in sub-15 nm templates

Takeharu Motokawa, MacHiko Suenaga, Kazuki Hagihara, Noriko Iida Nee Sakurai, Ryu Komatsu, Hideaki Sakurai, Shingo Kanamitsu, Keisuke Tsuda, Tetsuo Harada, Takeo Watanabe

Proceedings of SPIE - The International Society for Optical Engineering 11518 2020年
Removal of surface contamination by atomic hydrogen annealing

Akira Heya, Tetsuo Harada, Masahito Niibe, Koji Sumitomo, Takeo Watanabe

Journal of Photopolymer Science and Technology 33(4) 419-426 2020年
Analysis of chemical contents spatial distribution in euv resist using resonant soft X-ray scattering method

Jun Tanaka, Takuma Ishiguro, Tetsuo Harada, Takeo Watanabe

Journal of Photopolymer Science and Technology 33(5) 491-498 2020年
High-exposure-durability, high-quantum-efficiency (>90%) backside-illuminated soft-X-ray CMOS sensor

Tetsuo Harada, Nobukazu Teranishi, Takeo Watanabe, Quan Zhou, Jan Bogaerts, Xinyang Wang

Applied Physics Express 13(1) 2020年1月1日
Energy- And spatial-resolved detection using a backside-illuminated CMOS sensor in the soft X-ray region

Tetsuo Harada, Nobukazu Teranishi, Takeo Watanabe, Quan Zhou, Xiao Yang, Jan Bogaerts, Xinyang Wang

Applied Physics Express 12(8) 2019年8月1日査読有り
Removal of carbon contamination on oxidation-prone metal-coated mirrors using atomic hydrogen

Masahito Niibe, Tetsuo Harada, Akira Heya, Takeo Watanabe, Naoto Matsuo

AIP Conference Proceedings 2054 2019年1月15日査読有り
Research Activities of Extreme Ultraviolet Lithography at the University of Hyogo

Takeo Watanabe, Tetsuo Harada

Synchrotron Radiation News 32(4) 28-35 2019年
Development of an EUV and OoB Reflectometer at NewSUBARU synchrotron light facility

Keisuke Tsuda, Tetsuo Harada, Takeo Watanabe

Proceedings of SPIE - The International Society for Optical Engineering 11148 2019年
Fabrication of high-aspect-ratio transmission grating using DDR process for 10 nm EUV resist evaluation by EUV interference lithography

Mana Yoshifuji, Shota Niihara, Tetsuo Harada, Takeo Watanabe

Japanese Journal of Applied Physics 58(SD) 2019年査読有り
Resonant soft x-ray scattering for the stochastic origin analysis in euv resist

Jun Tanaka, Takuma Ishiguro, Tetsuo Harada, Takeo Watanabe

Journal of Photopolymer Science and Technology 32(2) 327-331 2019年査読有り
Resonant soft x-ray reflectivity for the chemical analysis in thickness direction of euv resist

Takuma Ishiguro, Jun Tanaka, Tetsuo Harada, Takeo Watanabe

Journal of Photopolymer Science and Technology 32(2) 333-337 2019年査読有り
Development of an EUV Microscope with Focused Coherent EUV Based on Coherent Diffraction Imaging Method for Defect Evaluation on an EUV Mask

Tetsuo Harada, Hiraku Hashimoto, Takeo Watanabe

Electronics and Communications in Japan 101(3) 11-16 2018年3月査読有り
A Study on Enhancing EUV Resist Sensitivity (2)

Atsushi Sekiguchi, Yoko Matsumoto, Mariko Isono, Michiya Naito, Yoshiyuki Utsumi, Tetsuo Harada, Takeo Watanabe

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY IX 10583 2018年査読有り
Reflectance measurement of EUV mirrors with s- and p- polarized light using polarization control units

Tetsuo Harada, Takeo Watanabe

Proceedings of SPIE - The International Society for Optical Engineering 10809 2018年査読有り
フォトダイオード直接塗布法によるEUVレジストの高精度な吸収係数測定法

新原章汰, 豆﨑大輝, 渡辺雅紀, 原田哲男, 渡邊健夫

応用物理学会学術講演会講演予稿集 10809 1631-1631 2018年査読有り
Fabrication of high-aspect-ratio transmission grating using DDR process for 10-nm EUV resist evaluation by EUV interference lithography

Mana Yoshifuji, Shota Niihara, Tetsuo Harada, Takeo Watanabe

Journal of Photopolymer Science and Technology 31(2) 215-220 2018年査読有り
Imaging performance improvement of coherent extreme-ultraviolet scatterometry microscope with high-harmonic-generation extreme-ultraviolet source

Daiki Mamezaki, Tetsuo Harada, Yutaka Nagata, Takeo Watanabe

Japanese Journal of Applied Physics 56(6) 2017年6月査読有り

MISC

200

EUVリソグラフィ用の実露光波長マスク検査装置の開発

原田哲男

レーザー研究 52(1) 31 2024年
BL-9Cビームライン【JST機械翻訳】

原田哲男

LASTI Annual Report (Web) 25 2024年
BL-10ビームライン【JST機械翻訳】

原田哲男

LASTI Annual Report (Web) 25 2024年
主鎖切断型レジストのEUV照射による現像特性評価

志賀竜太, 山川進二, 原田哲男

応用物理学会秋季学術講演会講演予稿集(CD-ROM) 85th 2024年
水素雰囲気中における高強度EUV照射によるEUVマスク吸収体の評価

石田隼登, 山川進二, 原田哲男

応用物理学会秋季学術講演会講演予稿集(CD-ROM) 85th 2024年

もっとみる

共同研究・競争的資金等の研究課題

EUV波面シンセサイザの開発と実時間・超深度ナノイメージングへの応用

日本学術振興会科学研究費助成事業基盤研究(C) 2019年4月 - 2022年3月

豊田光紀, 原田哲男
共鳴軟Ｘ線反射率測定によるフォトレジストの反応分布評価手法の開発

日本学術振興会科学研究費助成事業基盤研究(C) 2019年4月 - 2022年3月

原田哲男
軟X線領域の薄膜の光学定数の精密測定

日本学術振興会科学研究費助成事業基盤研究(B) 2015年4月 - 2018年3月

木下博雄, 原田哲男, 村松康司, 渡邊健夫, 渡邊健夫, 村松康司
高感度且つ低LWRを有する1Xnm級EUVレジストの開発

日本学術振興会科学研究費助成事業基盤研究(B) 2013年4月 - 2016年3月

渡邊健夫, 原田哲男, 木下博雄, 武藤正雄, 津野勝重
EUV 干渉露光による 20nm以下の極微細パタン形成

日本学術振興会科学研究費助成事業基盤研究(B) 2010年 - 2012年

渡邊健夫, 木下博雄, 原田哲男, 塩野大寿

もっとみる

産業財産権

特許6031659 短波長コヒーレント光源及び透過型の減光機構

永田豊, 原田哲男, 木下博雄
特許5846681 欠陥特性評価装置

原田哲男, 木下博雄, 臼井洋一, 渡邊健夫
特許5683236 形状測定装置

原田哲男, 木下博雄, 渡邊健夫
特願2010-192518 パタン幅測定装置

原田哲男, 木下博雄, 渡邊健夫

一覧へ戻る

原田 哲男

基本情報

研究キーワード

研究分野

経歴

学歴

論文

MISC

共同研究・競争的資金等の研究課題

産業財産権

原田哲男