神田 一浩

Abstract X-ray lithography was performed using synchrotron radiation to fabricate a nozzle array filter with submicron-order aperture diameters for a mesh nebulizer, as generating mist with a high yield of submicron-sized droplets is essential for delivering medication deep into the lungs. Utilizing polymethylmethacrylate as the resist material, precise control of X-ray exposure with distribution was performed to achieve submicron-order aperture fabrication, using a two-axis lead zirconate titanate stage with nanometer-scale positioning resolution. By precisely controlling the exposure process and development time on a minute scale, we successfully fabricated a nozzle array with submicron-order aperture diameters.