理工学部 教授

Takeo Nakano

  (中野 武雄)

Profile Information

Affiliation
Professor, Faculty of Science and Technology Department of Science and Technology , Seikei University
Degree
Doctor Engineering(The University of Tokyo)

Researcher number
40237342
J-GLOBAL ID
200901048314885741
researchmap Member ID
1000091733

External link

スパッタリング法を中心にした薄膜作製法、および薄膜の評価法について実験的な研究を行っています。

Papers

 43
  • Takeo Nakano, Kosuke Kimura, Yuto Iijima, Masato Takeuchi, Kei Oya, Masayoshi Nagao, Hisashi Ohsaki
    e-Journal of Surface Science and Nanotechnology, 22(3) 199-206, Apr 4, 2024  Peer-reviewedLead authorCorresponding author
    Mode transitions in reactive sputtering of metal (Ti, V) oxides are studied. Under a controlled Ar gas pressure at a flow rate of 10 sccm, direct current sputtering plasma was generated. The oxygen flow rate Q and discharge power P were changed in two ways (Q was varied at fixed P, and vice versa), and the mode transitions were monitored using the state jump in the discharge voltage. When the transition points (P, Q) were plotted as two-dimensional (2D) maps, the metal-to-oxide and oxide-to-metal transition points were found to be located on two corresponding straight lines that passed through the origin, irrespective of how the parameters were varied. The origin of this behavior is discussed and ascribed to the linear relationship between the input power and the sputter etching rate of the target. These results also suggest that the metal-mode, hysteresis, and oxide-mode regions of the 2D map can be determined by a few pilot experiments. By depositing vanadium oxide films under conditions in the oxide-mode region, near its boundary, films with very similar optical properties could be obtained.
  • Md. Suruz Mian, Takeo Nakano, Kunio Okimura
    Thin Solid Films, 769 139752-139752, Mar, 2023  Peer-reviewed
    Transparent conductive Al-doped Zinc oxide thin films were deposited on glass substrates by conventional radio frequency magnetron sputtering (C-RFMS) and inductively coupled plasma-assisted radio frequency magnetron sputtering (ICP-RFMS) methods. The structural and electrical properties of films were studied as a function of the radial position (r) of the substrate in both methods. A good thickness uniformity was obtained in ICP-RFMS, while a significant decrease in film thickness was observed at r=30 mm (erosion zone) in C-RFMS. The c-axis orientation was achieved in all positions in ICP-RFMS, while crystallinity was degraded at r≧25 mm in C-RFMS. Low resistivity ρ of the order of 10^-4 Ω cm was obtained at all positions in ICP-RFMS, while ρ was rapidly increased at r≧30 mm in C-RFMS. In ICP-RFMS, high-energy ion bombardment is suppressed due to the modified plasma density profile and lower space potential. As for transparency, the sample prepared at r=0 mm in ICP-RFMS showed an average visible transmittance of 81%, higher than that in C-RFMS. Throughout the study, it was demonstrated that ICP-RFMS method was promising to improve the radial distribution of structural, electrical, and optical properties of Al-doped ZnO thin films.
  • Md. Suruz Mian, Riko Yagi, Kei Oya, Takeo Nakano
    physica status solidi (a), 2100646-2100646, Dec 23, 2021  Peer-reviewed
  • Naohiro SHIMODA, Nao KOIDE, Tetsuo HONMA, Takeo NAKANO, Jin ZHANG, Hidenobu WAKITA, Shigeo SATOKAWA
    Journal of the Japan Petroleum Institute, 63(6) 365-374, Nov 1, 2020  Peer-reviewed
    Local structures of Ni species were evaluated in the NiO/γ-Al2O3 catalyst prepared via impregnation method for dimethyl sulfide (DMS) decomposition. Calcination and sulfurization conditions of the prepared catalyst influenced by the catalytic activity for DMS decomposition. The decomposition performance increased with sulfurization by H2S compared to sulfurization with DMS prior to the reaction test. X-ray diffraction and X-ray photoelectron spectroscopy analyses suggested that the active sites are NiS. In-situ X-ray absorption spectroscopy analysis was performed to examine the fine structural changes in Ni species before and after the sulfurization treatment. At 500°C calcination of the catalyst, Ni species were present as NiO and NiAl24 at a ration of 4:6 and only NiO was sulfurized to NiS which acted as the active sites. Meanwhile, for the catalyst calcined at 800°C, Ni species were nearly completely present as the Ni component in the NiAl2O4 structure, which was less susceptible to sulfurization than NiO. This result implied that the NiS amount in the catalyst calcined at 800°C was greatly reduced, resulting in lower decomposition activity.
  • Katsuya Iuchi, Kei Oya, Kazuki Hosoya, Kazuki Sasaki, Yuko Sakurada, Takeo Nakano, Hisashi Hisatomi
    Cytotechnology, 72(1) 131-140, Feb, 2020  Peer-reviewed
    Human embryonic kidney 293T (HEK293T) cells are used in various biological experiments and researches. In this study, we investigated the effect of cell culture environments on morphological and functional properties of HEK293T cells. We used several kinds of dishes made of polystyrene or glass for cell culture, including three types of polystyrene dishes provided from different manufacturers for suspension and adherent cell culture. In addition, we also investigated the effect of culturing on gelatin-coated surfaces on the cell morphology. We found that HEK293T cells aggregated and formed into three-dimensional (3-D) multicellular spheroids (MCS) when non-coated polystyrene dishes were used for suspension culture. In particular, the non-coated polystyrene dish from Sumitomo bakelite is the most remarkable characteristic for 3-D MCS among the polystyrene dishes. On the other hand, HEK293T cells hardly aggregated and formed 3-D MCS on gelatin-coated polystyrene dishes for suspension culture. HEK293T cells adhered on the non- or gelatin-coated polystyrene dish for adherent culture, but they did not form 3-D MCS. HEK293T cells also adhered to non- or gelatin-coated glass dishes and did not form 3-D MCS in serum-free medium. These results suggest that HEK293T cells cultured on non-coated polystyrene dish may be useful for the tool to analyze the characteristics of 3D-MCS.

Misc.

 32

Books and Other Publications

 9
  • 日本真空学会 (Role: Joint editor, 6.1 薄膜作製)
    コロナ社, Mar, 2018 (ISBN: 9784339009088)
    真空の基礎科学から作成・計測・保持する技術に関わる科学的基礎を解説。また,成膜,プラズマプロセスなどの応用分野で真空環境の役割を説き,極高真空などのこれまでにない真空環境が要求される研究・応用への取組みなどを紹介。
  • 表面技術協会 (Role: Joint author)
    コロナ社, May, 2013 (ISBN: 9784339046311)
    本書では,まずドライプロセスの歴史的発展過程にふれ,次にこれを支える基盤技術である「真空」「プラズマ」を解説。さらに,代表的なドライプロセスを取り上げ,どのような原理・原則に基づいているか,薄膜・表面評価分析技術について解説。
  • (Role: Joint author)
    シーエムシー出版, Mar, 2011 (ISBN: 9784781303215)
  • (Role: Editor)
    技術情報協会, Jan, 2009 (ISBN: 9784861042768)
  • (Role: Joint author)
    オーム社, Mar, 2008 (ISBN: 9784274205194)

Presentations

 11

Research Projects

 12