Yasuyuki Fukkushima, Ryuji Ohnishi, Takeo Watanabe, Hideaki Shiotani, Shouta Suzuki, Masamichi Hayakawa, Yusuke Endo, Tomotaka Yamanaka, Shinichi Yusa, Hiroo Kinoshita
Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC, 430-431, 2007
We developed and evaluated the PAG bonded resist that is a CA resist to reduce LER for EUVL. Under EUV exposure, E0 sensitivity of the PAG-bonded resist was 5 mJ/cm2. In order to clarify resolution and LER, EB exposure was performed, and LER of 3.5 nm (3a) in 75 nm L/S was achieved by PAG bonded resist. A LER of PAG bonded resist is smaller than that of PAG blended resist. It can be considered that the PAG density of PAG bonded resist has higher uniformity than that of PAG blended resist. In addition, resolution of 25 nm was achieved by the 50 kV EB writing tool. It is confirmed that PAG bonded resist have characteristics of high resolution and low LER. We will discuss of the improvement of exposure characteristics using beneficial PAG group in the PAG-bonded resist for EB and EUV resists.