原田 哲男

The pellicle plays a crucial role in the EUV photolithography process and has garnered increased attention from advanced semiconductor manufacturers as they strive to advance development for smaller process nodes. Carbon nanotubes (CNTs) are highly promising for EUV pellicle applications due to their exceptional mechanical, thermal, and optical properties. It is necessary for the pellicle to be durable and robust enough to withstand extreme scanner conditions, which involve combinations of high temperatures and active hydrogen species generated by EUV light. In this study, we present test results conducted to simulate the environment of the next-generation 600 W scanner using the NewSUBARU synchrotron light source facility. Our investigation focused on evaluating the performance of CNT films, both with and without protective coating layers. Surprisingly, the results indicate that the CNT film without coating demonstrated the most promising characteristics for pellicle applications, showcasing superior performance in the demanding EUV scanner environment.