CVClient

部家 彰

ヘヤ アキラ  (Akira Heya)

基本情報

所属
兵庫県立大学 大学院 工学研究科 材料・放射光工学専攻 准教授
学位
材料科学(北陸先端科学技術大学院大学)

J-GLOBAL ID
200901019380365490
researchmap会員ID
5000006324

外部リンク

委員歴

 5

論文

 145
  • Naoto MATSUO, Akira HEYA, Kazushige YAMANA, Koji SUMITOMO, Tetsuo TABEI
    IEICE Transactions on Electronics E107.C(3) 76-79 2024年3月1日  査読有り
  • Akira Heya, Akinori Fujibuchi, Masahiro Hirata, Yoshiaki Matsuo, Junichi Inamoto, Kazuhiro KANDA, Koji Sumitomo
    Japanese Journal of Applied Physics 2023年11月16日  査読有り
    <jats:title>Abstract</jats:title> <jats:p>The effects of soft X-ray irradiation and atomic hydrogen annealing (AHA) on the reduction of graphene oxide (GO) to obtain graphene were investigated. To clarify the interaction between soft X-rays and GO, soft X-rays of 300 eV and 550 eV were used for C 1s and O 1s inner-shell electron excitation, respectively at the NewSUBARU synchrotron radiation facility. Low-temperature reduction of the GO film was achieved by using soft X-ray at temperatures below 150 °C at 300 eV, and 60 °C at 550 eV. O-related peaks in X-ray photoelectron spectroscopy, such as the C–O–C peak, were smaller at 550 eV than those at 300 eV. This result indicates that excitation of the core–shell electrons of O enhances the reduction of GO. Soft X-rays preferentially break C–C and C–O bonds at 300 and 550 eV, respectively.</jats:p>
  • Akira Heya, Hideo Otsuka, Koji Sumitomo
    Journal of Photopolymer Science and Technology 36(4) 253-259 2023年6月15日  査読有り招待有り筆頭著者
  • Akira Heya, Koji Sumitomo
    Journal of Photopolymer Science and Technology 35(4) 351-357 2022年12月16日  査読有り
  • Akira HEYA, Akinori Fujibuchi, Masahiro Hirata, Kazuhiro KANDA, Yoshiaki Matsuo, Junichi INAMOTO, Koji Sumitomo
    Japanese Journal of Applied Physics 62(SC) SC1028-SC1028 2022年12月16日  査読有り
    <jats:title>Abstract</jats:title> <jats:p>The reduction of graphene oxide (GO) through atomic hydrogen annealing (AHA) and soft X-ray irradiation is investigated using microwell substrates with μm-sized holes with and without Ni underlayers. The GO film is reduced through AHA at 170 °C and soft X-ray irradiation at 150 °C. In contrast, some GO films are not only reduced but also amorphized through soft X-ray irradiation. The effect of the Ni underlayer on GO reduction differs between AHA and soft X-ray irradiation. In AHA, the difference in GO reduction between SiO<jats:sub>2</jats:sub> and Ni underlayer was originated from the atomic hydrogen density on sample surface. On the other hand, in soft X-ray irradiation, the difference in GO reduction between SiO<jats:sub>2</jats:sub> and the Ni underlayer originates from the excited electrons generated by soft X-ray irradiation. Reduction without damage is more likely to occur in the suspended GO than in the supported GO.</jats:p>

MISC

 69

書籍等出版物

 8

講演・口頭発表等

 59

担当経験のある科目(授業)

 4

所属学協会

 2

共同研究・競争的資金等の研究課題

 21