Spatial Distribution Analysis of Functional Groups in Resist Thin Film Using Reflection-Mode Resonant Soft X-ray Scattering

Yuri Ebuchi, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe

Journal of Photopolymer Science and Technology, 37(6) 591-595, Dec 25, 2024
Observation Result of Chemical Composition Distribution of Resist Thin Film by Photoemission Electron Microscopy

Tsukasa Sasakura, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe

Journal of Photopolymer Science and Technology, 37(6) 585-590, Dec 25, 2024
Current Status of EUV Flood Exposure Tool at NewSUBARU BL03

Ryuta Shiga, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe

Journal of Photopolymer Science and Technology, 37(6) 579-584, Dec 25, 2024
EUV durability of CNT pellicles for next-generation scanner

Takahiro Ueda, Marcio D. Lima, Tetsuo Harada, Takeo Watanabe, Takeshi Kondo

Japanese Journal of Applied Physics, 63(3), Mar 1, 2024
Carbon/boron multilayer for beyond EUV lithography

Umi Fujimoto, Tetsuo Harada, Shinji Yamakawa, Takeo Watanabe

Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, Sep 29, 2023

Misc.

193

Resonant Soft X-Ray Scattering in Reflection-mode for Spacial Evaluation in Resist Thin Film

中本敦啓, 山川進二, 原田哲男, 渡邊健夫

X線分析討論会講演要旨集, 58th, 2022
EUV mask observation by coherent EUV scatterometry microscope

原田哲男, 渡邊健夫

応用物理学会春季学術講演会講演予稿集(CD-ROM), 68th, 2021
Study of relationship between DNA damage by radiation and change of the characteristic of DNA transistor

吉田一輝, 松尾直人, 住友弘二, 部家彰, 山名一成, 原田哲男, 渡邊健夫, 田部井哲夫

生体医歯工学共同研究拠点成果報告書, 2020, 2021
A Global Shutter Wide Dynamic Range Soft X-Ray CMOS Image Sensor with 45μm-Thick Backside-Illuminated Pinned Photodiode and Two-Stage LOFIC

四家寛也, 黒田理人, 黒田理人, 黒田理人, 小林諒太, 村田真麻, 藤原康行, 鈴木学, 原田将真, 柴口拓, 栗山尚也, 初井宇記, 宮脇淳, 宮脇淳, 宮脇淳, 原田哲男, 山崎裕一, 山崎裕一, 渡邊健夫, 原田慈久, 原田慈久, 須川成利, 須川成利

映像情報メディア学会技術報告, 45(11(IST2021 8-21)), 2021
軟X線領域において量子効率90%以上の性能を有する背面照射型CMOSイメージセンサの開発

原田哲男, 寺西信一, 寺西信一, 渡邊健夫, ZHOU Quan, BOGAERTS Jan, WANG Xinyang

日本放射光学会年会・放射光科学合同シンポジウム(Web), 33rd, 2020

Books and Other Publications

882

EUVリソグラフィおよびレジスト・フォトマスクの概要、Beyond EUVLへの将来展望～目指すべき半導体業界の将来像～

「EUVリソグラフィ」AndTech WEB講習会（オンライン）, May 25, 2023
Technical issue of EUVL, prospect for EUVL and beyond EUVL

Takeo Watanabe

IEUVI Resist TWG Workshop 2023 (online) Invited
EUVリソグラフィ技術開発の現状およびその取り巻く環境、今後の展開

第253回フォトポリマー懇話会講演会先端・次世代リソグラフィ技術（オンライン）, Apr 25, 2023
EUVリソグラフィー技術開発の現状および今後の展開について

第70回応用物理学会春季学術講演会シンポジウムマイクロ・ナノスケール微細加工の表面界面先端技術
ニュースバルにおけるEUVL基板技術開発の現状と今後の展開

ニュースバルシンポジウム2023, Mar 13, 2023

Precise measurement of optical constants of thin films in soft X-ray region

Grants-in-Aid for Scientific Research Grant-in-Aid for Scientific Research (B), Japan Society for the Promotion of Science, Apr, 2015 - Mar, 2018

Kinoshita Hiroo, WATANABE Takeo, MURAMATSU Yasuji
Development of 1X nm EUV Resist with high sensitivity and Low LWR

Grants-in-Aid for Scientific Research Grant-in-Aid for Scientific Research (B), Japan Society for the Promotion of Science, Apr, 2013 - Mar, 2016

Watanabe Takeo, HARADA Tetsuo, KINOSHITA Hiroo, MUTO Masao, TSUNO Katsushige
Resist pattern replication using EUV interference lithography for 20 nm and below

Grants-in-Aid for Scientific Research Grant-in-Aid for Scientific Research (B), Japan Society for the Promotion of Science, 2010 - 2012

WATANABE Takeo, KINOSHITA Hiroo, HARADA Tetsuo, SHIONO Daiju
Chemical genetics on protein acetylation, a key reaction regulating biological functions

Grants-in-Aid for Scientific Research Grant-in-Aid for Scientific Research (A), Japan Society for the Promotion of Science, 2003 - 2005

YOSHIDA Minoru, YASHIRODA Yoko, YOSHIDA Yukiko, KAMEMURA Kazuo
Fabrication of aspherical surfaces for soft X-Ray optical elements by means of Deposition techniques

Grants-in-Aid for Scientific Research Grant-in-Aid for Scientific Research (C), Japan Society for the Promotion of Science, 1999 - 2001

NIIBE Masahito, WATANABE Takeo, KINOSHITA Hiroo