CVClient

Akira Heya

  (部家 彰)

Profile Information

Affiliation
Graduate School, of Engineering, University of Hyogo
Degree
材料科学(北陸先端科学技術大学院大学)

J-GLOBAL ID
200901019380365490
researchmap Member ID
5000006324

External link

Committee Memberships

 5

Papers

 145
  • Naoto MATSUO, Akira HEYA, Kazushige YAMANA, Koji SUMITOMO, Tetsuo TABEI
    IEICE Transactions on Electronics, E107.C(3) 76-79, Mar 1, 2024  Peer-reviewed
  • Akira Heya, Akinori Fujibuchi, Masahiro Hirata, Yoshiaki Matsuo, Junichi Inamoto, Kazuhiro KANDA, Koji Sumitomo
    Japanese Journal of Applied Physics, Nov 16, 2023  Peer-reviewed
    <jats:title>Abstract</jats:title> <jats:p>The effects of soft X-ray irradiation and atomic hydrogen annealing (AHA) on the reduction of graphene oxide (GO) to obtain graphene were investigated. To clarify the interaction between soft X-rays and GO, soft X-rays of 300 eV and 550 eV were used for C 1s and O 1s inner-shell electron excitation, respectively at the NewSUBARU synchrotron radiation facility. Low-temperature reduction of the GO film was achieved by using soft X-ray at temperatures below 150 °C at 300 eV, and 60 °C at 550 eV. O-related peaks in X-ray photoelectron spectroscopy, such as the C–O–C peak, were smaller at 550 eV than those at 300 eV. This result indicates that excitation of the core–shell electrons of O enhances the reduction of GO. Soft X-rays preferentially break C–C and C–O bonds at 300 and 550 eV, respectively.</jats:p>
  • Akira Heya, Hideo Otsuka, Koji Sumitomo
    Journal of Photopolymer Science and Technology, 36(4) 253-259, Jun 15, 2023  Peer-reviewedInvitedLead author
  • Akira Heya, Koji Sumitomo
    Journal of Photopolymer Science and Technology, 35(4) 351-357, Dec 16, 2022  Peer-reviewed
  • Akira HEYA, Akinori Fujibuchi, Masahiro Hirata, Kazuhiro KANDA, Yoshiaki Matsuo, Junichi INAMOTO, Koji Sumitomo
    Japanese Journal of Applied Physics, 62(SC) SC1028-SC1028, Dec 16, 2022  Peer-reviewed
    <jats:title>Abstract</jats:title> <jats:p>The reduction of graphene oxide (GO) through atomic hydrogen annealing (AHA) and soft X-ray irradiation is investigated using microwell substrates with μm-sized holes with and without Ni underlayers. The GO film is reduced through AHA at 170 °C and soft X-ray irradiation at 150 °C. In contrast, some GO films are not only reduced but also amorphized through soft X-ray irradiation. The effect of the Ni underlayer on GO reduction differs between AHA and soft X-ray irradiation. In AHA, the difference in GO reduction between SiO<jats:sub>2</jats:sub> and Ni underlayer was originated from the atomic hydrogen density on sample surface. On the other hand, in soft X-ray irradiation, the difference in GO reduction between SiO<jats:sub>2</jats:sub> and the Ni underlayer originates from the excited electrons generated by soft X-ray irradiation. Reduction without damage is more likely to occur in the suspended GO than in the supported GO.</jats:p>

Misc.

 69

Books and Other Publications

 8

Presentations

 59

Teaching Experience

 4

Research Projects

 21